Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Yoshinori Nagaoka"'
Autor:
Yoshinori Nagaoka, Junji Miyazaki
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39a2fa7b34b50c12abb3c55aa7e42c66
https://doi.org/10.1117/12.2208944
https://doi.org/10.1117/12.2208944
Autor:
Klaus-Dieter Roeth, Akira Fuse, Frank Laske, Slawomir Czerkas, Shunsuke Sato, Tatsuhiko Kamibayashi, Mehdi Daneshpanah, Shinji Kunitani, Naoki Takahashi, Yoshinori Nagaoka
Publikováno v:
SPIE Proceedings.
In recent years, 193nm immersion lithography has been extended instead of adopting EUV lithography. And multi-patterning technology is now widely applied, which requires tighter specification as the pattern size gets smaller on advanced semiconductor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8273b937e82f196c6b0a7aeb4e2af897
https://doi.org/10.1117/12.2070399
https://doi.org/10.1117/12.2070399
Publikováno v:
Environment Control in Biology. 32:219-224
This study was undertaken to promote saikosaponins accumulation in the leaves of a medicinal plant, Bupleurum falcatum, grown in solution culture. Effects of air temperature, relative humidity (R.H.), photosynthetic photon flux density (PPFD), photop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5e83bdaa4341f696615061dbcd61c21
https://doi.org/10.2525/ecb1963.32.219
https://doi.org/10.2525/ecb1963.32.219
Publikováno v:
Physical Review B. 49:585-588
For ${\mathrm{Gd}}_{2}$${\mathrm{CuO}}_{4}$, a symmetry-forbidden phonon for the tetragonal T' structure is observed. This shows that oxygen in the ${\mathrm{CuO}}_{2}$ plane is locally distorted along the plane. Such distortion has not been observed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::154b5349e8f48ed3e66ebaf3f6faf9ca
https://doi.org/10.1103/physrevb.49.585
https://doi.org/10.1103/physrevb.49.585
Publikováno v:
SPIE Proceedings.
Photomask Japan each year hosts a meeting inviting the conference attendees to actively participate in a discussion on a selected topic. The topic selected for this year is on new mask inspection and metrology techniques that are just emerging in the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05e2b8c5cbbcd2962a734d056507fcf0
https://doi.org/10.1117/12.868534
https://doi.org/10.1117/12.868534
Autor:
Hiroshi Mohri, Kunihiro Hosono, Keiko Hattori, Shogo Narukawa, Wayne Ruch, Morihisa Hoga, Yoshinori Nagaoka, Yumiko Maenaka, Toshio Suzuki, Masayoshi Mori, Venu Vellanki
Publikováno v:
SPIE Proceedings.
We have evaluated a unified mask pattern data format named "OASIS.MASK"1 and a unified job deck format named "MALY" 2 for mask tools as the input data formats of the inspection tool using the mask data and the photomask produced with the 65nm design
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a854f63b79d89bcfd6f1f78174f95fb6
https://doi.org/10.1117/12.824351
https://doi.org/10.1117/12.824351
Autor:
Yoshinori Nagaoka, Toshiaki Kojima, Takanobu Kobayashi, Paul Yu, Jinggang Zhu, Koji Kaneko, Norihiko Takatsu, Kosuke Ito
Publikováno v:
SPIE Proceedings.
This paper discusses the most efficient mask re-qualification inspection mode for 7Xnm half pitch design node production memory reticles in advanced memory wafer fab. By comparing overall performance including inspectability, sensitivity, and through
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a321d6c819c16c3dac02a4ec24edb253
https://doi.org/10.1117/12.793092
https://doi.org/10.1117/12.793092
Autor:
Takao Konishi, Kaustuve Bhattacharyya, Yoshinori Nagaoka, Norihiko Takatsu, Christopher M. Aquino, William Volk
Publikováno v:
SPIE Proceedings.
A traditional method of mask quality control in a fab has been wafer image qualification i.e., wafer inspection on printed monitor wafer or wafer inspection on production wafer. But recently many fabs that are using DUV lithography for low k1 process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0951a12b82e853bd24a92360491a653d
https://doi.org/10.1117/12.557730
https://doi.org/10.1117/12.557730
Publikováno v:
Journal of Superconductivity. 7:449-451
For Gd2CuO4, a new symmetry-forbidden phonon for the tetragonal T′ structure is observed. This implies that oxygen in the CuO2 plane is locally distorted along the CuO2 plane. Such distortion has never been observed for other T′-type superconduct
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d004878b49e7ddd1735c6de427e24b71
https://doi.org/10.1007/bf00724587
https://doi.org/10.1007/bf00724587
Autor:
Hiroyoshi Tanabe, Yoshinori Nagaoka
Publikováno v:
SPIE Proceedings.
We discussed the following topics at the panel discussion of Photomask Japan 2002. 1) Pushing the limit of ArF lithography: How far ArF lithography will extend? 2) Current status and issues for F 2 lithography, 3) Current status and issues for EPL, 4
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b30f0b612368f5b0f3cdc5e0d4a1d93f
https://doi.org/10.1117/12.467903
https://doi.org/10.1117/12.467903