Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Yoshinobu Ohya"'
Autor:
Bibhuti Bhusan Sahu, Kazuya Nakane, Kenji Ishikawa, Makoto Sekine, Takayoshi Tsutsumi, Taku Gohira, Yoshinobu Ohya, Noriyasu Ohno, Masaru Hori
Publikováno v:
Physical Chemistry Chemical Physics. 24:13883-13896
A modified Boltzmann equation using the corona model was used to study the plasma characteristics of a pulse plasma etching process.
Autor:
Makoto Sekine, Manabu Iwata, Masaru Hori, Hiroki Kondo, Keigo Takeda, Takayoshi Tsutsumi, Hideo Sugai, Yoshinobu Ohya, Kenji Ishikawa, Yusuke Fukunaga, Toshinari Ueyama
Publikováno v:
Japanese Journal of Applied Physics. 56:06HC03
Electron behaviors in a pulsed dual radio frequency (RF) capacitively coupled plasma of a mixture of C4F8, O2, and Ar gases, where the DC bias of −300 V in the RF-on period was imposed and synchronously increased to −1000 V in the RF-off period,
Autor:
Keigo Takeda, Kenji Ishikawa, Masaru Hori, Tsuyoshi Yamaguchi, Makoto Sekine, Hiroki Kondo, Yoshinobu Ohya, Tatsuya Komuro
Publikováno v:
Journal of Physics D: Applied Physics. 50(15):155201-155201
We present experimentally determined spatial profiles of the interelectrode electron density (n e) in dual-frequency capacitively coupled plasmas in which the negative direct current (dc) bias voltage (V dc) is superposed; in the experiment, 13 MHz (
Publikováno v:
Japanese Journal of Applied Physics. 55:080309
To elucidate the pulsed fluorocarbon plasma behavior, a surface-wave probe with high time resolution was used to measure the electron density n e in the afterglow of plasma. In a dual-frequency capacitively coupled plasma of fluorocarbon chemistry, e
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 34:040602
High aspect-ratio etching of SiO2 by fluorocarbon (FC) plasmas (C4F6/O2/Ar) requires an in-depth understanding of the reactions on the SiO2 surface. Reactive gaseous FC species deposited on the surface and the bombardment of this FC layer with highly
Publikováno v:
Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul/Aug2016, Vol. 34 Issue 4, p1-5, 5p
Autor:
Zhou Li Zhong, Jingnan Liu, Kouji Matsuo, Hideo Furuhashi, Yoshiyuki Uchida, V T Chitnis, Atsushi Shirakawa, Yuichi Teramura, Humihiko Kannari, D Tanooka, S Itoh, I Hirosawa, Y. Takasawa, H Yoneda, K Ueda, D Watanabe, S Oda, H Shibata, K Toyoda, K TAJIMA, T UCHIYAMA, T ARAKI, K WATANABE, Y KUBOTA, Rie TAZAWA, Norio TUDA, Jun YAMADA, Naohito BANNO, Shinobu OHARA, Hirotaka KOTAKE, Daichi SUGIMOTO, Shigeru YAMAGUCHI, Tomoo FUJIOKA, Y Oki, J. Takafuji, M Maeda, N Kawada, Y Isei, T Honda, Yuki Ninomiya, Satoshi Hashimoto, Masahiro Kawasaki, Ping Gu, Masahiko Tani, Kiyomi Sakai, Michael Herrmann, Shingo ONO, Shinji IZUMIDA, Zhenlin LIU, Takayuki YANO, Hideyuki OHTAKE, Nobuhiko SARUKURA, M Kano, K Ogasawara, Y Douura, Hidetoshi Terada, Takao TANAKA, Yasukazu IZAWA, T Miyakoshi, K A Tanaka, R Kodama, N Izumi, K Takahashi, T Matsusita, T Iwatani, T Koase, T Yamanaka, K. Mima, Yoshinobu Ohya, Akihiro Kono, T Yamauchi, E Minehara, N Kikuzawa, N Nishimori, R Nagai, G Hayakawa, S Sawamura, M Sugimoto, Tatsuo Okada, Kouki Morishita, Yutaka Higuchi, Noriyo Sakurada, T Etoh, N Kawashima, T Nakayama, N Tohge, H Nakano, Y Hashishin, M Kattoh, M Iwasaki, Shin YOSHIKADO, Tadashi ARUGA, Shin-ichi KITA, Tsukasa Kitahara, Takuya D Kawahara, Fumitoshi Kobayashi, Yasunori Saioh, Akio Namura
Publikováno v:
The Review of Laser Engineering. 27:103-103,106
Autor:
Akihiro Kono, Yoshinobu Ohya
Publikováno v:
Japanese Journal of Applied Physics. 39:1365
Behaviors of electrons and negative ions in a capacitively coupled RF (13.56 MHz) plasma of c-C4F8 (perfluorocycrobutane) were studied using a laser-induced photodetachment technique in combination with a microwave cavity resonance technique. The res
Autor:
Toshinari Ueyama, Yusuke Fukunaga, Takayoshi Tsutsumi, Keigo Takeda, Hiroki Kondo, Kenji Ishikawa, Makoto Sekine, Manabu Iwata, Yoshinobu Ohya, Hideo Sugai, Masaru Hori
Publikováno v:
Japanese Journal of Applied Physics; Jun2017, Vol. 56 Issue 6S2, p1-1, 1p
Autor:
Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro, Tsuyoshi Yamaguchi, Keigo Takeda, Hiroki Kondo, Makoto Sekine, Masaru Hori
Publikováno v:
Journal of Physics D: Applied Physics; 4/20/2017, Vol. 50 Issue 15, p1-1, 1p