Zobrazeno 1 - 10
of 224
pro vyhledávání: '"Yoshinobu Kawai"'
Publikováno v:
AIP Advances, Vol 8, Iss 2, Pp 025316-025316-10 (2018)
A triode multi-hollow VHF SiH4/H2 plasma (60 MHz) was examined at a pressure of 20 Pa by two-dimensional simulations using the fluid model. In this study, we considered the effect of the rate constant of reaction, SiH3 + SiH3→SiH2 + SiH4, on the pl
Externí odkaz:
https://doaj.org/article/0476d3af0ab248a8b8e41611eee6c2e2
Autor:
Chen-Jui Liang, Ying-Hung Chen, Jia-Lin Syu, Kam-Hong Chau, Chi Wai Kan, Yoshinobu Kawai, Ju-Liang He, Yen-Chun Liu
Publikováno v:
Japanese Journal of Applied Physics. 61:SA1020
A homemade Langmuir probe was constructed to investigate the plasma characteristics of high power impulse magnetron sputtering (HIPIMS) for copper deposition. Five sets of HIPIMS power delivery parameters were selected for use in a constant-current m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a27bd3f4fddcb749134f58536609fa37
https://doi.org/10.35848/1347-4065/ac1486
https://doi.org/10.35848/1347-4065/ac1486
Publikováno v:
Japanese Journal of Applied Physics. 60:SAAB03
A capacitively coupled Ar plasma was produced by the ultra-high frequency power source (450 MHz) and the plasma parameters were studied by Laser Thomson scattering. It was found that a very high density plasma with a low electron temperature was real
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5aec44c8f64372b150cb4669a3fdbd4
https://doi.org/10.35848/1347-4065/abbb6b
https://doi.org/10.35848/1347-4065/abbb6b
Autor:
Ting Kuei Lien, Kohei Ogiwara, Kuo Feng Chiu, Kuan Chen Chen, Yoshinobu Kawai, Kiichiro Uchino, Cheng Yang Lien, Masaaki Tanaka, Yu Jer Tsai, Fumihiko Matsunaga, Chia-Fu Chen
Publikováno v:
Plasma Processes and Polymers. 13:584-587
A capacitively coupled VHF H2 plasma (60 MHz) was produced by a narrow gap discharge at high pressures, and spatial distributions of the plasma parameters were examined with the Langmuir probe. A bi-Maxwellian electron distribution was observed near
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d78ce22da026cbb405c691d90c0f3577
https://doi.org/10.1002/ppap.201500183
https://doi.org/10.1002/ppap.201500183
Autor:
Kuo-Feng Chiu, Jen-Bin Shi, Shui-Yang Lien, Cheng-Yang Lien, Jui-Hao Wang, Chia-Fu Chen, Ching-Lung Yang, Yoshinobu Kawai, Yu-Jer Tsai, Ting-Kuei Lien
Publikováno v:
Vacuum. 121:289-293
We produced a VHF H 2 plasma (frequency, 60 MHz) by a narrow-gap discharge and examined the plasma parameters as a function of pressure and power, where two parallel plate electrodes (400 × 300 mm 2 ) were used. The plasma density reached a peak at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a426febee5e48712c3266a62a68d43a6
https://doi.org/10.1016/j.vacuum.2015.02.037
https://doi.org/10.1016/j.vacuum.2015.02.037
Autor:
Tomi T. Li, L.C. Hu, Ta-Chin Wei, Cheng-Chung Lee, Yoshinobu Kawai, C.J. Wang, G.M. Ruan, Y.W. Lin
Publikováno v:
Thin Solid Films. 570:574-579
An electron cyclotron resonance chemical vapor deposition (ECR-CVD) system applied in a hydrogenated amorphous silicon (a-Si:H) thin-film deposition process was diagnosed in-situ by using optical emission spectroscopy (OES) and a Langmuir probe. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e759b774ce27e208479ae282a6e9c8b
https://doi.org/10.1016/j.tsf.2014.05.063
https://doi.org/10.1016/j.tsf.2014.05.063
Publikováno v:
Plasma Processes and Polymers. 11:545-550
We proposed the floating potential method to estimate the negative ion density in a negative ion plasma. The floating potential in a negative ion double plasma was examined as a function of negative ion concentration and compared with the theoretical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::747eabaffa0bf01ea135693fcd0549ce
https://doi.org/10.1002/ppap.201300148
https://doi.org/10.1002/ppap.201300148
Publikováno v:
Thin Solid Films. 547:132-136
The effects of a balanced power feeding (BPF) method on a very high frequency hydrogen plasma produced with narrow-gap parallel plate electrodes are studied by 2-dimensional simulation. It was found that the electron density increases inside the elec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28f59add8fd0e7c9f2bc5e409b06f262
https://doi.org/10.1016/j.tsf.2013.04.054
https://doi.org/10.1016/j.tsf.2013.04.054
Autor:
Kiichiro Uchino, Hiroshi Muta, Yoshinobu Kawai, Sachiko Nakao, Tsukasa Yamane, Yoshiaki Takeuchi, Ryuta Ichiki
Publikováno v:
Contributions to Plasma Physics. 53:588-591
The parameters of a SiH4/H2 VHF plasma were measured as a function of silane gas concentration with a heated Langmuir probe. It was found that when the sailane gas concentration is increased, the nagative ion density increases. Here the negative ion
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44f7591fcb06f1749b9ff564b9f821fe
https://doi.org/10.1002/ctpp.201200125
https://doi.org/10.1002/ctpp.201200125
Autor:
Sachiko Nakao, Hiromu Takatsuka, Yoshinobu Kawai, Yoshiaki Takeuchi, Hiroshi Muta, Yasuhiro Yamauchi, Kiichiro Uchino, Tsukasa Yamane
Publikováno v:
Surface and Coatings Technology. 228:S433-S436
A VHF SiH4/H2 plasma was produced using a multi rod electrode and the plasma parameters were measured using a heated Langmuir probe, where the frequency of the power source was 80 MHz. The Langmuir probe characteristics indicated that when the concen
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e879871cc48b7436874f057b8d4d76c1
https://doi.org/10.1016/j.surfcoat.2012.05.036
https://doi.org/10.1016/j.surfcoat.2012.05.036