Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Yoshiki Nakatani"'
Autor:
Shunsuke Nakakura, Asuka Noguchi, Hirotaka Tanabe, Hitoshi Tabuchi, Akira Yorihiro, Kazuaki Nishimura, Ryota Aoki, Yoshiki Nakatani, Shouichi Hasegawa, Yoshiaki Kiuchi
Publikováno v:
Translational Vision Science & Technology
Purpose We developed and evaluated an eye dropper bottle sensor system comprising motion sensor with automatic motion waveform analysis using deep learning (DL) to accurately measure adherence of patients with antiglaucoma ophthalmic solution therapy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::67c78e12ce61c2d7268bfc150561c6bb
https://doi.org/10.1167/tvst.8.3.55
https://doi.org/10.1167/tvst.8.3.55
Publikováno v:
Jiban Kogaku Janaru (Japanese Geotechnical Journal). 6:121-128
本ノートでは，一連の室内試験から得られた廃ガラス製品の一種である「ガラスサンド」の地盤工学的特性について述べている。まず，物理試験，透水試験およびpH測定試験から，廃ガ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::313f5c161890c449f766daa2cd7ac9c5
https://doi.org/10.3208/jgs.6.121
https://doi.org/10.3208/jgs.6.121
Publikováno v:
Applied Surface Science. :633-637
A strongly preferential orientation of the (100) or the (110) plane has been obtained in polycrystalline Si films on quartz plates deposited from Si3H8 by photo-CVD. The (110) plane is obtained in films deposited below 560°C but it turns to (100) ab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3b0b4fe9cdcef737f7f8422955b23798
https://doi.org/10.1016/0169-4332(89)90134-7
https://doi.org/10.1016/0169-4332(89)90134-7
Autor:
Hitomi Bunki, Michihito Ishizawa, Toshinori Hasegawa, Koji Inoue, Jiro Kawamura, Masaaki Makikawa, Kanji Schichikawa, Yoshitaka Takenaka, Yoshiki Nakatani, Shoji Nishi, Hiroyuki Horio
Publikováno v:
Biomechanisms. 8:185-196
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::40dba3d1f88768c079e5a1ea860aacfe
https://doi.org/10.3951/biomechanisms.8.185
https://doi.org/10.3951/biomechanisms.8.185
Publikováno v:
Journal of Applied Physics. 64:6496-6501
A new technology for low‐temperature growth of good‐quality silicon dioxide (SiO2) thin films has been developed. The film growth technology is a double‐excitation photoinduced chemical vapor deposition using vacuum ultraviolet and ultraviolet
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9c03a59dade63acf60f55915f185971b
https://doi.org/10.1063/1.342067
https://doi.org/10.1063/1.342067
Publikováno v:
Japanese Journal of Applied Physics. 28:829
Si films deposited on quartz plates grown from Si3H8 by thermal and photo-CVD have shown a strong crystalline orientation and are preferentially grown as (110) planes at substrate temperatures below 560°C, but turn to (100) above 575°C. In the tran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::165db80f299a3e03b4207325f8dc8cde
https://doi.org/10.1143/jjap.28.829
https://doi.org/10.1143/jjap.28.829