Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Yoshikazu Nakazono"'
Publikováno v:
The Journal of Physical Chemistry B. 102:927-930
The photochemical decomposition mechanism of sulfonium compounds, an important photoacid generator (PAG) in lithography, was extensively studied by ab initio quantum chemical research. The homolyti...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee397e1eaad1090552a92b1ad3753a1b
https://doi.org/10.1021/jp9726100
https://doi.org/10.1021/jp9726100
Publikováno v:
Journal of Photopolymer Science and Technology. 10:485-488
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61709218be0fdd3ccad813bb5037f6e7
https://doi.org/10.2494/photopolymer.10.485
https://doi.org/10.2494/photopolymer.10.485
Publikováno v:
Journal of Photopolymer Science and Technology. 9:693-696
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8635f9215f7071b8f6912b09cdd5e55b
https://doi.org/10.2494/photopolymer.9.693
https://doi.org/10.2494/photopolymer.9.693
Publikováno v:
Journal of Photopolymer Science and Technology. 9:587-590
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::48ed8f4736723f862872aafc0aa3e12a
https://doi.org/10.2494/photopolymer.9.587
https://doi.org/10.2494/photopolymer.9.587
Autor:
Minoru Tsuda, Etsuo Hasegawa, Kaichiro Nakano, Akiko Tsujino, Yoshikazu Nakazono, Setsuko Oikawa, Norihito Ohmori, Masayuki Hata
Publikováno v:
Journal of Photopolymer Science and Technology. 8:611-614
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e39a9446d7050dce54f46ebfbc4735e6
https://doi.org/10.2494/photopolymer.8.611
https://doi.org/10.2494/photopolymer.8.611