Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Yoshihisa Oosaki"'
Autor:
Kotaro Ooishi, Yasuyoshi Sasagawa, Naoya Hayashi, Hideaki Sakurai, Kazuo Sakamoto, Hiroyuki Miyashita, Yoshihisa Oosaki, Mika Nakao, Yukihiko Esaki, Shinji Tanabe, Masamitsu Itoh, Toshiharu Nishimura
Publikováno v:
SPIE Proceedings.
In recent years, more precise pattern dimension control (CD control) on a photomask has been required than ever as finer-line of IC pattern progresses. In the case of the conventional development (spray-development, puddle-development), CD control is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bfbc8c6efcde579ec1708394c2ada09b
https://doi.org/10.1117/12.504050
https://doi.org/10.1117/12.504050
