Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Yoshihiro Kida"'
Publikováno v:
2018 IEEE International Symposium on Electromagnetic Compatibility and 2018 IEEE Asia-Pacific Symposium on Electromagnetic Compatibility (EMC/APEMC).
In recent years, it has become essential to use simulation to design noise filters because the development of fast-switching devices has increased the noise in power electronics products. This paper proposes a simulation method for conducted emission
Publikováno v:
2016 International Symposium on Electromagnetic Compatibility - EMC EUROPE.
Grounding structure of the shielded cable at the high voltage battery side and that of the power converter chassis have significant influences on common-mode current emitted from a converter such as a DC-DC converter in electric vehicles. In this pap
Autor:
Hideto Miyake, Kazumasa Hiramatsu, Akira Iishiga, Tomohiko Shibata, H. Naoi, Yoshihiro Kida, Mitsuhiro Tanaka
Publikováno v:
physica status solidi (c). :2128-2131
Conductivity control of 1-μm-thick Si-doped Al0.5Ga0.5N using an epitaxial AlN underlying layer wasrealized by introducing CH3SiH3 during low-pressure metalorganic vapor phase epitaxy. Cathodoluminescence measurements indicated that luminescence fro
Autor:
Tomohiko Shibata, Yoshihiro Kida, Kazumasa Hiramatsu, Noriyuki Kuwano, Hideto Miyake, T. Tsuruda
Publikováno v:
physica status solidi (c). :2444-2447
Cross sectional transmission electron microscope (TEM) observation was performed to understand the behavior of threading dislocations (TDs) in an AlxGa1−xN layer epitaxially grown on an AlN/α-sapphire (0001) template. In the AlN template, TDs with
Autor:
Kazutoshi Fukui, Kazuyuki Tadatomo, Hideto Miyake, Youichiro Ohuchi, Yutaka Hamamura, Yasuhiro Shibata, K. Ohta, H. Yasukawa, Yoshihiro Kida, Kazumasa Hiramatsu, Atsushi Motogaito
Publikováno v:
physica status solidi (a). 200:151-154
A high responsivity spectrum in the near ultraviolet (UV) and the vacuum UV (VUV) region was realized using Schottky UV detectors consisting of Al0.5Ga0.5N on an AlN epitaxial layer. The cut-off wavelength of AlGaN UV detectors was 4.7 eV (265 nm), a
Publikováno v:
physica status solidi (a). 194:498-501
High-quality AlGaN with high Al content was grown on high-quality epitaxial AlN film on sapphire (0001) by low-pressure metal organic vapour phase epitaxy (LP-MOVPE). The obtained Al x Ga 1-x N (0.2 < x < 0.8) thicker than 0.9 μm had atomically smoo
Autor:
Yoshihiro Kida
Publikováno v:
Journal of JSEE. 53:12-14
Publikováno v:
Japanese Journal of Applied Physics. 42:L572-L574
The crystalline quality of AlGaN with high AlN molar fraction grown by low-pressure metalorganic vapor phase epitaxy (LP-MOVPE) was improved by using high-quality epitaxial AlN film on sapphire (0001). Atomically flat AlxGa1-xN (0.2
Autor:
Kohji Hasegawa, Akira Takeshita, Sigemasa Hanazawa, Makoto Kobayashi, Toshikazu Yasui, Yoshihiro Kida, Yoshimasa Okamatsu, Takao Suzuki
Publikováno v:
Cytokine. 29(4)
Interleukin-1 (IL-1) plays a crucial role in the immunopathological responses involved with tissue destruction in chronic inflammatory diseases, such as periodontal disease, as it stimulates host cells including fibroblasts to produce various inflamm
Autor:
Keiichiro Asai, Teruyo Nagai, Yoshihiro Kida, Kazumasa Hiramatsu, Tomohiko Shibata, Osamu Oda, Hideto Miyake, Shigeaki Sumiya, Mitsuhiro Tanaka
Publikováno v:
MRS Proceedings. 693
We demonstrate high-quality epitaxial AlN films on C-plane sapphire as a new buffer layer technique for the growth of high-quality GaN. The obtained GaN films were atomically flat and the full width at half maximum (FWHM) values of the X-ray rocking