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pro vyhledávání: '"Yoshihiro Kamon"'
Publikováno v:
Journal of Photopolymer Science and Technology. 15:535-540
We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9- methacryloyloxy-4-oxatricyclo[5.2.1.0 2,6 ]decan-3-one (OTDMA) and , -di