Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Yoshihiko Yanagisawa"'
Autor:
Takeshi Serizawa, Tomoji Kawai, Yoshihiko Yanagisawa, Tsutomu Furuzono, Keiko Furukawa, Hidekazu Tanaka, Masahiro Okada
Publikováno v:
Langmuir. 25:6300-6306
Interfacial interactions between calcined hydroxyapatite (HAp) nanocrystals and surface-modified substrates were investigated by measuring adsorption behavior and adhesion strength with a quartz crystal microbalance (QCM) and a contact-mode atomic fo
Autor:
Tomoji Kawai, Bong Kuk Lee, Hidekazu Tanaka, Naoki Suzuki, HeaYeon Lee, Yoshihiko Yanagisawa, Luca Pellegrino, Satoru Yamanaka
Publikováno v:
Journal of the Vacuum Society of Japan. 51:37-43
Transition metal oxide films show a rich variety of peculiar properties, such as ferroelectricity, ferromagnetism, high Tc superconductivity, colossal magnetoresistance, and so on. The method to process the oxide films down to nano scale is still und
Autor:
Hidekazu Tanaka, Takuya Matsumoto, Tomoji Kawai, Mizue Ishikawa, Luca Pellegrino, Yoshihiko Yanagisawa
Publikováno v:
Advanced materials (Weinh., Print) 18 (2006): 3099–3104. doi:10.1002/adma.200600997
info:cnr-pdr/source/autori:Luca Pellegrino; Yoshihiko Yanagisawa; Mizue Ishikawa; Takuya Matsumoto; Hidekazu Tanaka; Tomoji Kawai/titolo:(Fe,Mn)3O4 Nanochannels Fabricated by AFM Local-Oxidation Nanolithography using Mo%2FPoly(methyl methacrylate) Nanomasks/doi:10.1002%2Fadma.200600997/rivista:Advanced materials (Weinh., Print)/anno:2006/pagina_da:3099/pagina_a:3104/intervallo_pagine:3099–3104/volume:18
info:cnr-pdr/source/autori:Luca Pellegrino; Yoshihiko Yanagisawa; Mizue Ishikawa; Takuya Matsumoto; Hidekazu Tanaka; Tomoji Kawai/titolo:(Fe,Mn)3O4 Nanochannels Fabricated by AFM Local-Oxidation Nanolithography using Mo%2FPoly(methyl methacrylate) Nanomasks/doi:10.1002%2Fadma.200600997/rivista:Advanced materials (Weinh., Print)/anno:2006/pagina_da:3099/pagina_a:3104/intervallo_pagine:3099–3104/volume:18
Epitaxial (Fe,Mn)(3)O-4 thin films are patterned into nanochannels using molybdenum/poly(methyl methacrylate) (PMMA) nanomasks realized by combining local anodic oxidation of Mo and dry etching of PMMA. Nanostructures on the 100 nm scale can be easil
Autor:
Keisuke Ishikawa, Yuko Sawai, Yoshihiko Yanagisawa, Shunsuke Kijima, Y. Chiba, Motoshi Nakamura, Kyouhei Horiguchi, Hideki Hakuma
Publikováno v:
2012 38th IEEE Photovoltaic Specialists Conference.
The efficiency of 17.8% on a 30 × 30cm2-sized Cu(In,Ga)(Se,S) 2 (CIS)-based thin-film submodule was achieved. The device structure is same as our previous works; monolithically integrated CIS-based cells on a Mo-deposited glass substrate with a Zn(O
Autor:
Giovanna Canu, Mizue Ishikawa, Emilio Bellingeri, Hidekazu Tanaka, Daniele Marré, Luca Pellegrino, Antonio Sergio Siri, Yoshihiko Yanagisawa, I. Pallecchi, Tomoji Kawai, Takuya Matsumoto
Publikováno v:
Journal of nanoscience and nanotechnology. 10(7)
In this paper we show diverse methods for patterning transition metal oxide (TMO) thin films by Local Anodic Oxidation (LAO) using an Atomic Force Microscope (AFM). At first, direct lithography by current-controlled LAO of TMO thin films and selectiv
Publikováno v:
Applied physics letters 89 (2006): 253121-1–253121-3. doi:10.1063/1.2423235
info:cnr-pdr/source/autori:Yoshihiko Yanagisawa; Hidekazu Tanaka; Tomoji Kawai; Luca Pellegrino/titolo:Digitalized magnetoresistance observed in (La,Pr,Ca)MnO3 nanochannel structures/doi:10.1063%2F1.2423235/rivista:Applied physics letters/anno:2006/pagina_da:253121-1/pagina_a:253121-3/intervallo_pagine:253121-1–253121-3/volume:89
info:cnr-pdr/source/autori:Yoshihiko Yanagisawa; Hidekazu Tanaka; Tomoji Kawai; Luca Pellegrino/titolo:Digitalized magnetoresistance observed in (La,Pr,Ca)MnO3 nanochannel structures/doi:10.1063%2F1.2423235/rivista:Applied physics letters/anno:2006/pagina_da:253121-1/pagina_a:253121-3/intervallo_pagine:253121-1–253121-3/volume:89
We have examined the magnetoresistances of (La,Pr,Ca)MnO3 channel structures with different channel widths. The 500 nm channel showed an extremely sharp metallic transition from charge ordered insulator to ferromagnetic metal at low temperature, whil
Publikováno v:
Journal of Applied Physics. 100:124316
We have applied the atomic force microscopy (AFM) lithography technique to electrically phase-separated (La,Pr,Ca)MnO3 (LPCMO) thin films. It was found that the maximum pattern height of 10.5nm for the as-deposited film was much higher than that of 5
Publikováno v:
Applied Physics Letters. 89:163113
The technique of atomic force microscope nanolithography was used to construct robust nano-structures with atomically flat surface of ferromagnetic perovskite manganites down to 30nm in size over 5μm long. The resulting (La,Ba)MnO3 nanochannel posse