Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Yoshihide Kihara"'
Publikováno v:
2022 6th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d376cdb8288321fba59f1f3729b85053
https://doi.org/10.1109/edtm53872.2022.9798176
https://doi.org/10.1109/edtm53872.2022.9798176
Publikováno v:
Japanese Journal of Applied Physics. 61:SI1015
We demonstrated a coverage-controllable sidewall protective film by controlling the degree of oxidation during plasma-enhanced SiO2 atomic layer deposition (ALD) as a novel technology to suppress bowing in a high-aspect-ratio-contact (HARC) hole etch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1603d7234b3af0de194dc6a600ae21f9
https://doi.org/10.35848/1347-4065/ac647e
https://doi.org/10.35848/1347-4065/ac647e
Autor:
Shota Yoshimura, Yannick Feurprier, Yoshihide Kihara, Arnaud Dauendorffer, Tetsuya Nishizuka, Noriaki Nagamine, Kenta Ono, Takahiro Shiozawa, Shinya Morikita, Keisuke Yoshida, Kathleen Nafus, Atsutoshi Inokuchi, Satoru Shimura, Kiyoshi Maeda, Ken Kobayashi
Publikováno v:
Advances in Patterning Materials and Processes XXXVIII.
Extreme ultraviolet (EUV) lithography faces major challenges for smaller nodes due to the impact of stochastic and processing failures.1 One of the main challenges for pitch shrink at these nodes is the optimization of the trade-off between break typ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4483d854536a268b1f80160886a5e34
https://doi.org/10.1117/12.2583772
https://doi.org/10.1117/12.2583772
Publikováno v:
Advanced Etch Technology for Nanopatterning IX.
We demonstrated a high selective and anisotropic plasma etch of Si3N4 and SiC. The demonstrated process consists of a sequence of ion modification and chemical dry removal steps. The Si3N4 etch with H ion modification showed a high selectivity to SiO
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29eb6ad4d089961f549aff6b4aec99aa
https://doi.org/10.1117/12.2555805
https://doi.org/10.1117/12.2555805
Publikováno v:
Hyomen Kagaku. 38:210-215
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::92b1fdfbdd0dfd1943228e957d5d0a2f
https://doi.org/10.1380/jsssj.38.210
https://doi.org/10.1380/jsssj.38.210
Publikováno v:
Advanced Etch Technology for Nanopatterning VIII.
In patterning etch processes, the fabrication of multilayer films requires the precision of atomic scale X-Y CD controllability in complex hole patterns, and reduction of local variability such as Line Edge Roughness (LER), Line Width Roughness (LWR)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f79297c8d10d5d654986c80c5bb60c5
https://doi.org/10.1117/12.2513832
https://doi.org/10.1117/12.2513832
Autor:
Takayuki Katsunuma, Tomoyuki Oishi, Akihiro Tsuji, Masahiro Tabata, Ogawa Shuhei, Toru Hisamatsu, Masanobu Honda, Yoshihide Kihara
Publikováno v:
ECS Transactions. 75:3-10
In recent years, the progression of very large scale integration of semiconductor devices and miniaturization require extension of ultra-high selectivity process and CD control technique exhibiting atomic-layer-level control. We introduce herein a st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d867e3b1d684a360391a87564c5e94e3
https://doi.org/10.1149/07506.0003ecst
https://doi.org/10.1149/07506.0003ecst
Publikováno v:
The Astrophysical Journal. 514:524-528
The reaction of H with solid thin films of C2H4 and C2H6 deposited on the silicon substrate at 13 K was studied using the thermal desorption method and Fourier transform-infrared (FT-IR) spectroscopy. In the reaction of H with C2H4, the formation of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3170143ea1ffa8299b3b05fbacfe8d16
https://doi.org/10.1086/306942
https://doi.org/10.1086/306942
Autor:
Kazuyoshi Yamamoto, Kenzo Hiraoka, Akihiro Yamashita, Takashi Miyagoshi, Nagayuki Oohashi, Yoshihide Kihara
Publikováno v:
The Astrophysical Journal. 508:423-430
In the interstellar clouds, a number of oxygen-containing organic compounds such as alcohols and carbonium compounds have been observed. In order to investigate the role of grain processes for the formation and destruction of these compounds, thin fi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::689a3ad1a3e6d18c3dada5d59c747246
https://doi.org/10.1086/306385
https://doi.org/10.1086/306385
Publikováno v:
The Astrophysical Journal. 498:710-715
The reactions of H atoms with C, O, CO, and CH3CN in solid phase at 12 K were investigated by temperature-programmed mass spectrometry. In the reaction of H atoms with C atoms trapped in the CO matrix, H atoms migrate in the CO matrix and react with
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c37e3bb7151e59d8957fa2876446a7a9
https://doi.org/10.1086/305572
https://doi.org/10.1086/305572