Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Yoshiaki Kohama"'
Autor:
Saori Fukui, Aoyama Takashi, Kazuaki Suzuki, Toshimasa Shimoda, Takaharu Miura, Tomoharu Fujiwara, Hiroshi Hirose, Junji Ikeda, Futoshi Mori, Hiroyasu Shimizu, Hidekazu Takekoshi, Shigeru Takemoto, Norihiro Katakura, Takehisa Yahiro, Toru Tanida, Kenji Morita, Yoshiaki Kohama, Suzuki Motoko, Atsushi Yamada, Takaaki Umemoto, Yukiharu Ohkubo, Teruaki Okino, Kaoru Ohmori, Takeshi Yoshioka, Yoichi Watanabe, Yukio Kakizaki, Shintaro Kawata, Shohei Suzuki, Noriyuki Hirayanagi, Shinichi Kojima, Hajime Yamamoto, Jin Udagawa, Kazunari Hada
Publikováno v:
J. Vac. Sci. Technol. B. 22(No. 6):2885-2890
Electron projection lithography (EPL) is a realistic technology for the 65nm node and below, as a complementary technology of optical lithography especially for contacts and gate layers because of its high resolution and large process margin. Nikon h
Publikováno v:
Journal of Society of Materials Engineering for Resources of Japan. 13:76-81
This paper analyzes spectral reflectance information in order to understand color features. Twenty-three-color image data are taken by using a monochrome CCD (Charge Coupled Device) camera through three filters: X, Y and Z filters on condition that t
Autor:
Hiroshi Chiba, Yoshiaki Kohama, Hidemi Kawai, Kazunari Hada, Takaharu Miura, Yukiharu Ohkubo, Kenji Morita, Katsuhiko Murakami, Tetsuya Oshino, Kazushi Nomura, Hiroyuki Kondo
Publikováno v:
SPIE Proceedings.
Exposure performance of projection optics with different flare level was compared in EUV1. Ultimate resolution of EUV1 was evaluated using alternate phase shift mask and resist modulation was obtained down to 16nmL/S. Modeling of carbon contamination
Autor:
Yoshiaki Kohama, Kenji Morita, Hidemi Kawai, Kazunari Hada, Takaharu Miura, Yukiharu Ohkubo, Katsuhiko Murakami
Publikováno v:
Proceeding of SPIE. 6517
Nikon has been developing the full field exposure tool called EUV1 for process development of 32nm hp node and beyond. The unique feature of EUV1 is the capability of variable illumination coherence and off-axis illumination. EUV1 was installed in Se
Autor:
Takeshi Asami, Yukiharu Ohkubo, Kazuaki Suzuki, Takaharu Miura, Katsuhiko Murakami, Yoshiaki Kohama
Publikováno v:
SPIE Proceedings.
Extreme Ultra Violet Lithography (EUVL) is considered as the most promising technology below hp45nm node, following ArF immersion lithography. In this paper we would like to present significant progress on the development of EUV exposure tool with re
Autor:
Shigeru Takemoto, Yukiharu Ohkubo, Suzuki Motoko, Shinichi Kojima, Kazuya Okamoto, Takeshi Yoshioka, Kaminaga Takeshi, Toru Tanida, Atsushi Yamada, Sumito Shimizu, Hiroyasu Shimizu, Masateru Tokunaga, Keiichi Hirose, Muneki Hamashima, Takaharu Miura, Tatsuo Sato, Kazunari Hada, Teruaki Okino, Yu Sato, Takehisa Yahiro, Jin Udagawa, Tomoharu Fujiwara, Shin-ichi Takahashi, Yoshiaki Kohama, Junji Ikeda, Hajime Yamamoto, Noriyuki Hirayanagi, Shintaro Kawata, Satoshi Katagiri, Hiroshi Hirose, Futoshi Mori, Takaaki Umemoto, Kazuaki Suzuki, Toshimasa Shimoda, Saori Fukui, Yoichi Watanabe, Yukio Kakizaki, Kenji Morita, Hidekazu Takekoshi
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21:2686
Electron projection lithography (EPL) is one of the promising technologies below the 65 nm node, especially for contact hole and gate layers. Nikon is developing an EPL exposure tool as an electron beam (EB) stepper and the first generation EB steppe