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pro vyhledávání: '"Yoshiaki Inda"'
Autor:
Yasuhiko Kimura, Yasuharu Okamoto, Toshio Yumiyama, Akihiro Ochi, Shiro Ninomiya, Yoshiaki Inda, Mitsukuni Tsukihara
Publikováno v:
2014 20th International Conference on Ion Implantation Technology (IIT).
Needless to say, productivity of ion implantation processes is a very important issue for economical device fabrication. Reduction of implant areas is one of the essential keys to increase a beam utilization factor for high-current ion implanters. SE
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9f69b44251fc06307bc8d84ad45fcfff
https://doi.org/10.1109/iit.2014.6940028
https://doi.org/10.1109/iit.2014.6940028
