Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Yongju Jang"'
Publikováno v:
KIISE Transactions on Computing Practices. 27:376-381
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::101b723aab5ba0806e85eea9e817253a
https://doi.org/10.5626/ktcp.2021.27.8.376
https://doi.org/10.5626/ktcp.2021.27.8.376
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
Extreme ultraviolet lithography (EUVL) has received a considerable attention in the semiconductor industry as a promising candidate to achieve the high resolution pattern beyond 10nm. To achieve it, pellicle is essential to prevent the reticle from p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::db377b979df0da9c619cacbe55682bdb
https://doi.org/10.1117/12.2501772
https://doi.org/10.1117/12.2501772
Publikováno v:
Proceedings of SPIE; 8/25/2018, Vol. 10809, p108090R-1-108090R-4, 4p