Zobrazeno 1 - 10
of 70
pro vyhledávání: '"Yongbo, Su"'
Publikováno v:
Micromachines, Vol 15, Iss 4, p 527 (2024)
The single-event effects (SEEs) of frequency divider circuits and the radiation tolerance of the hardened circuit are studied in this paper. Based on the experimental results of SEEs in InP HBTs, a transient current model for sensitive transistors is
Externí odkaz:
https://doaj.org/article/21da059ce10643cab49cd1fc3147ce0c
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 8, Pp 600-607 (2020)
In this paper, we introduce novel surface treatments of UV/Ozone and TMAH to solve the surface problem of gate recess of InAlAs/InGaAs InP-based HEMTs. The problem of nonstoichiometric surface of InP etch stopper layer was found to be the result of d
Externí odkaz:
https://doaj.org/article/7eb243b0a0df4893824439b070c241b3
Autor:
Yongbo Su
Publikováno v:
IEEE Access, Vol 8, Pp 136966-136977 (2020)
Scientific selection of building materials supplier is of great importance in the management of construction projects. In this work, the selection problem of building material suppliers is investigated under the background of economic globalization b
Externí odkaz:
https://doaj.org/article/1cfe27505cdb49d3a2d5b8056c24aaca
Publikováno v:
IEEE Transactions on Electron Devices. 70:2262-2267
Autor:
Chen Zhang, Yongbo Su, Bo Mei, Feng Yang, Jialin Zhang, Huanqing Yun, Bo Liu, Yi Sun, Haiming Zhang, Zhi Jin, Yinghui Zhong
Publikováno v:
Current Applied Physics. 48:47-52
Autor:
Yanzhe Wang, Jianjun Ding, Ruize Feng, Shurui Cao, Fugui Zhou, Wuchang Ding, Yongbo Su, Zhi Jin
Publikováno v:
IEEE Transactions on Electron Devices. 70:941-946
Publikováno v:
IEEE Transactions on Electron Devices. 70:934-940
Publikováno v:
Computers, Materials & Continua. 75:5965-5986
Autor:
Peng Ding, Chen Chen, Muhammad Asif, Xi Wang, Jiebin Niu, Feng Yang, Wuchang Ding, Yongbo Su, Dahai Wang, Zhi Jin
Publikováno v:
IEEE Journal of the Electron Devices Society, Vol 6, Pp 49-54 (2018)
This paper introduces a novel surface passivation using Si3N4 (20-nm)/Al2O3 (15-nm) stack layers in InAlAs/InGaAs InP-based high-electron-mobility transistors (HEMTs). The new technology gives rise to good dc and RF performances in InP-based HEMTs. N
Externí odkaz:
https://doaj.org/article/36e5a13e20294a1db3ab5d65b2542ba3
Publikováno v:
IEEE Transactions on Circuits and Systems II: Express Briefs. 69:4243-4247