Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Yong-Min Yoo"'
Autor:
Dong-Hwa Chung, Kang-Soon Ahn, Dae-Kyong Kim, Young-Un Park, Yong-Min Yoo, Ji-Young So, Ju-Hee Cho
Publikováno v:
The Transactions of The Korean Institute of Electrical Engineers. 62:1528-1534
This paper proposes the optimal design of stator shape for cogging torque reduction of single-phase brushless DC (BLDC) motor with asymmetric notch. This method applied size and position of asymmetric notches to tapered teeth of stator for single-pha
Autor:
Yong-Min Yoo, Byung-il Kwon
Publikováno v:
Journal of Electrical Engineering and Technology. 2:50-54
In this paper, a dual-servo type VCM (Voice Coil Motor) for the measuring of nano-level displacement and small thrust is proposed and developed. The shape of VCM for improving the resolution of displacement and ensuring a large displacement are prese
Publikováno v:
Journal of Electrical Engineering and Technology. 1:92-97
This paper presents the characteristic analysis and the optimal design of a permanent magnetic actuator (PMA) for a vacuum circuit breaker (VCB) using a two-dimensional finite element analysis. The purpose of this research about a PMA is to minimize
Autor:
Yong-Min Yoo, Patrick Wong, Hessel Sprey, Diziana Vangoidsenhoven, Tae-Ho Yoon, Hyung-Sang Park, M. Demand, Tom Vandeweyer, S. Locorotondo, Andy Miller, Mireille Maenhoudt, Julien Beynet
Publikováno v:
SPIE Proceedings.
The inherent advantages of the Plasma-Enhanced Atomic Layer Deposition (PEALD) technologyexcellent conformality and within wafer uniformity, no loading effectovercome the limitations in this domain of the standard PECVD technique for spacer depos
Autor:
Yong-Min Yoo, Dae-jin Kwon, Ho-Kyu Kang, Yong-kuk Jeong, Choon-Soo Lee, Jae-Hwan Ka, Duck-Hyung Lee, Moon-han Park, Hong-ki Kim, Dae-Youn Kim, Kwan-Young Yun, Kwang-Pyuk Suh, Seok-jun Won
Publikováno v:
2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407).
We have developed a plasma enhanced atomic layer deposition(PEALD) technology for high-k dielectrics such as Al/sub 2/O/sub 3/,Ta/sub 2/O/sub 5/ and HfO/sub 2/. Film quality and throughput of PEALD are far superior to that of ALD which has been spotl
Autor:
Seok-Jun Won, Yong-Kuk Jeong, Dae-Jin Kwon, Moon-Han Park, Ho-Kyu Kang, Kwang-Pyuk Suh, Hong-Ki Kim, Jae-Hwan Ka, Kwan-Young Yun, Duck-Hyung Lee, Dae-Youn Kim, Yong-Min Yoo, Choon-Soo Lee
Publikováno v:
2003 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.03CH37407); 2003, p23-24, 2p