Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Yong Keng Goh"'
Autor:
Han-Hao Cheng, Andrew K. Whittaker, Idriss Blakey, Bruce W. Smith, Lan Chen, Warren Montgomery, Peng Xie, Yong Keng Goh
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 50:4255-4265
Photon-mediated switching of polymer solubility plays a crucial role in the manufacture of integrated circuits by photolithography. Conventional photoresists typically rely on a single switching mechanism based on either a change in polarity or, mole
Autor:
Andrew K. Whittaker, Yong Keng Goh, Paul Zimmerman, Kirsten Jean Lawrie, Lan Chen, Ya-Mi Chuang, Idriss Blakey, Emil Piscani
Publikováno v:
Radiation Physics and Chemistry. 80:242-247
The use of norbornene-based polysulfones as non-chemically amplified resists (non-CARs) for 193 nm immersion lithography was explored. Allylbenzene was incorporated into the polymer backbone to increase the absorbance of the polymers. The effect of p
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 45:4150-4153
The effect of molecular weight on the cross-linking behavior and the trifunctional telechelic thiolated polymers was investigated. A trifunctional RAFT agent was used to make PSTY three-arm stars of molecular weight ranging from 3400 to 6200 with pol
Autor:
Yong Keng Goh, Sébastien Perrier, Thomas M. Legge, Hesna Gemici, Michael R. Whittaker, Michael J. Monteiro
Publikováno v:
Macromolecules. 39:9028-9034
By carefully controlling the concentration of α,ω-thiol polystyrene in solution, we achieved formation of unique monocyclic polystyrene chains (i.e., polymer chains with only one disulfide linkage). The presence of cyclic polystyrene was confirmed
Autor:
Michael J. Monteiro, Yong Keng Goh
Publikováno v:
Macromolecules. 39:4966-4974
This work has demonstrated that for the first time a single RAFT agent (i. e., difunctional) can be used in conjunction with a radical initiator to obtain a desired M-n and PDI with controlled rates of polymerization. Simulations were used not only t
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 43:5232-5245
The use of phenyldithioacetic acid (PDA) in homopolymerizations of styrene or methyl acrylate produced only a small fraction of chains with dithioester end groups. The polymerizations using 1-phenylentyl phenyldithioacetate (PEPDTA) and PDA in the sa
Autor:
Warren Montgomery, Andrew K. Whittaker, Idriss Blakey, Anneke Dorgelo, Neal Lafferty, Bruce W. Smith, Yong Keng Goh, Lan Chen, Paul Zimmerman, Xie Peng
Publikováno v:
SPIE Proceedings.
Chain scissioning resists do not require addition of photoacid generators to function. Previously reported chain scissioning polysulfone resists were able to achieve enhanced sensitivity by incorporation of absorbing repeat units, but these groups al
Autor:
Andrew K. Whittaker, Ya-Mi Chuang, Emil Piscani, Paul A. Zimmerman, Lan Chen, Idriss Blakey, Kirsten Jean Lawrie, Yong Keng Goh
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Initial studies are presented on the use of polysulfones as non-chemically amplified resists (non-CARs) for 193 nm immersion lithography. Polynorbornene sulfone films on silicon wafers have been irradiated with 193 nm photons in the absence of a phot
Versatile synthetic approach to reversible crosslinked polystyrene networks via RAFT polymerization.
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry; Sep2007, Vol. 45 Issue 17, p4150-4153, 4p