Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Yong Keng Goh"'
Autor:
Han-Hao Cheng, Andrew K. Whittaker, Idriss Blakey, Bruce W. Smith, Lan Chen, Warren Montgomery, Peng Xie, Yong Keng Goh
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 50:4255-4265
Photon-mediated switching of polymer solubility plays a crucial role in the manufacture of integrated circuits by photolithography. Conventional photoresists typically rely on a single switching mechanism based on either a change in polarity or, mole
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c6e70d176cf72e7c7943d9ddbc24c050
https://doi.org/10.1002/pola.26232
https://doi.org/10.1002/pola.26232
Autor:
Andrew K. Whittaker, Yong Keng Goh, Paul Zimmerman, Kirsten Jean Lawrie, Lan Chen, Ya-Mi Chuang, Idriss Blakey, Emil Piscani
Publikováno v:
Radiation Physics and Chemistry. 80:242-247
The use of norbornene-based polysulfones as non-chemically amplified resists (non-CARs) for 193 nm immersion lithography was explored. Allylbenzene was incorporated into the polymer backbone to increase the absorbance of the polymers. The effect of p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e7ce36423995f20d66a35bf034310e6
https://doi.org/10.1016/j.radphyschem.2010.07.040
https://doi.org/10.1016/j.radphyschem.2010.07.040
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 45:4150-4153
The effect of molecular weight on the cross-linking behavior and the trifunctional telechelic thiolated polymers was investigated. A trifunctional RAFT agent was used to make PSTY three-arm stars of molecular weight ranging from 3400 to 6200 with pol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22f9944e96ff8b7fa4d327572d2f45b8
https://doi.org/10.1002/pola.22162
https://doi.org/10.1002/pola.22162
Autor:
Yong Keng Goh, Sébastien Perrier, Thomas M. Legge, Hesna Gemici, Michael R. Whittaker, Michael J. Monteiro
Publikováno v:
Macromolecules. 39:9028-9034
By carefully controlling the concentration of α,ω-thiol polystyrene in solution, we achieved formation of unique monocyclic polystyrene chains (i.e., polymer chains with only one disulfide linkage). The presence of cyclic polystyrene was confirmed
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::693640b7f1f9a09f5783bc03e5d77f8b
https://doi.org/10.1021/ma061070e
https://doi.org/10.1021/ma061070e
Autor:
Michael J. Monteiro, Yong Keng Goh
Publikováno v:
Macromolecules. 39:4966-4974
This work has demonstrated that for the first time a single RAFT agent (i. e., difunctional) can be used in conjunction with a radical initiator to obtain a desired M-n and PDI with controlled rates of polymerization. Simulations were used not only t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f7124a24ed6c4b61a778ee8fbd34056
https://doi.org/10.1021/ma060395s
https://doi.org/10.1021/ma060395s
Publikováno v:
Journal of Polymer Science Part A: Polymer Chemistry. 43:5232-5245
The use of phenyldithioacetic acid (PDA) in homopolymerizations of styrene or methyl acrylate produced only a small fraction of chains with dithioester end groups. The polymerizations using 1-phenylentyl phenyldithioacetate (PEPDTA) and PDA in the sa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f9daf236a67155960e9ccbf09f8e2784
https://doi.org/10.1002/pola.21020
https://doi.org/10.1002/pola.21020
Autor:
Warren Montgomery, Andrew K. Whittaker, Idriss Blakey, Anneke Dorgelo, Neal Lafferty, Bruce W. Smith, Yong Keng Goh, Lan Chen, Paul Zimmerman, Xie Peng
Publikováno v:
SPIE Proceedings.
Chain scissioning resists do not require addition of photoacid generators to function. Previously reported chain scissioning polysulfone resists were able to achieve enhanced sensitivity by incorporation of absorbing repeat units, but these groups al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2539745aab8867be3e5b3f8b518ed9f
https://doi.org/10.1117/12.881700
https://doi.org/10.1117/12.881700
Autor:
Andrew K. Whittaker, Ya-Mi Chuang, Emil Piscani, Paul A. Zimmerman, Lan Chen, Idriss Blakey, Kirsten Jean Lawrie, Yong Keng Goh
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Initial studies are presented on the use of polysulfones as non-chemically amplified resists (non-CARs) for 193 nm immersion lithography. Polynorbornene sulfone films on silicon wafers have been irradiated with 193 nm photons in the absence of a phot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de7606b1e1e25060f1445c89466f5807
https://doi.org/10.1117/12.814076
https://doi.org/10.1117/12.814076
Versatile synthetic approach to reversible crosslinked polystyrene networks via RAFT polymerization.
Publikováno v:
Journal of Polymer Science. Part A, Polymer Chemistry; Sep2007, Vol. 45 Issue 17, p4150-4153, 4p