Výsledky vyhledávání

Novel Wafer Bevel Treatment for Water Immersion Lithography

Autor: Takeo Ishibashi, Jianhai Jiang, Tetsuro Hanna, Yoko Takebe, Tomoharu Fujiwara, Teruhiko Kumada, Shinya Wakamizu, Takafumi Niwa, Osamu Yokokoji, Takuya Hagiwara, Mamoru Terai, Hideharu Kyouda

Publikováno v: Journal of Photopolymer Science and Technology. 21:665-672

In this study, we focus on the controllability of a wafer bevel from adhesion and hydrophobicity viewpoints in order to solve the problems of film peeling and microdroplet formation around wafer bevels, which can result in pattern defects and degradi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fe0d70a7d46767583b2b90ab50ed7986
https://doi.org/10.2494/photopolymer.21.665

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Development of Novel Materials for 193-nm Dry and Immersion Lithography

Autor: Naoko Shirota, Yoko Takebe, Shu-Zhuong Wang, Sasaki Takashi, Osamu Yokokoji

Publikováno v: Journal of Photopolymer Science and Technology. 19:573-578

We earlier developed new monocyclic fluoropolymers (FUGU) for F2 resist materials. But, it is necessary for FUGU to be improved in their characteristics, especially in the dry-etching resistance, in order to apply to ArF lithography at fine design ru

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f740310c39a49a06d1267e0900517e4c
https://doi.org/10.2494/photopolymer.19.573

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A New Monocyclic Fluoropolymer for 157-nm Photoresists

Autor: Sasaki Takashi, Yoko Takebe, Osamu Yokokoji, Kiyoshi Fujii, Akihito Otoguro, Toshio Itani, Masataka Eda, Shigeo Irie

Publikováno v: Journal of Photopolymer Science and Technology. 17:639-644

We earlier developed a series of fluoropolymers (FPRs) for use as first-generation 157-nm photoresist polymers. These FPRs have a partially fluorinated monocyclic structure and provide excellent transparency. However, their etching resistance is low

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4121e4b31b9d66d2824891b0438fcb84
https://doi.org/10.2494/photopolymer.17.639

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157-nm Single-Layer Resists Based on Main-Chain-Fluorinated Polymers

Autor: Shigeo Irie, Seiichi Ishikawa, Takuya Hagiwara, Tamio Yamazaki, Takamitsu Furukawa, Toshiro Itani, Yasuhide Kawaguchi, Syun-ichi Kodama, Osamu Yokokoji, Isamu Kaneko, Yoko Takebe, Shinji Okada

Publikováno v: Japanese Journal of Applied Physics. 42:3743-3747

Fluoropolymers are key materials for single layer resists of 157-nm lithography. We have been studying fluoropolymers to identify their potential for base resins of 157-nm photoresist. New monocyclic fluoropolymer resist which we developed have high

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d3453da39f466764b52814856e206dd8
https://doi.org/10.1143/jjap.42.3743

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Generation and Carbonyl Addition Reactions of Dibromofluoromethyllithium Derived from Tribromofluoromethane as Applied to the Stereoselective Synthesis of Fluoro Olefins and 2-Bromo-2-fluoro-1,3-alkanediols

Autor: Yoko Takebe, Manabu Kuroboshi, Nobuko Yamada, Masaki Shimizu, Tamejiro Hiyama, Takeshi Hata

Publikováno v: Bulletin of the Chemical Society of Japan. 71:2903-2921

The treatment of tribromofluoromethane with BuLi in THF–Et2O (2 : 1) at −130 °C generated dibromofluoromethyllithium, which was allowed to react smoothly with a coexisting aldehyde or ketone (RR′C=O) to give fluorinated alcohol RR′C(OH)CFBr2

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::44bb334616c79267dd22a9cc1b74e09b
https://doi.org/10.1246/bcsj.71.2903

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Development of new resist materials for 193-nm dry and immersion lithography

Autor: Naoko Shirota, Sasaki Takashi, Osamu Yokokoji, Yoko Takebe

Publikováno v: Microelectronic Engineering. 83:1091-1093

We earlier developed new monocyclic fluoropolymers (FUGU) for F 2 resist materials. But, it is necessary for FUGU to improve of their characteristics, especially the dry-etching resistance, in order to apply for ArF lithography at fine design rules.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c8e79e3ae293805f6bb5ca459fa739c6
https://doi.org/10.1016/j.mee.2006.01.024

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Diastereoselective generation of lithium carbenoid reagent RCH(OMEM)CFBrLi and its reaction with electrophiles

Autor: Masaki Shimizu, Yoko Takebe, Manabu Kuroboshi, Tamejiro Hiyama

Publikováno v: Tetrahedron Letters. 37:7387-7390

Treatment of RCH(OMEM)CFBr2 with n-BuLi at −130 °C in the presence of 4-heptanone gives the corresponding adduct diastereoselectively. The stereochemical outcome is explained in terms of the chelation between lithium and oxygen atoms of the MEM gr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::68ae0b60748e18d6663f598da3ed1929
https://doi.org/10.1016/0040-4039(96)01684-x

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Stereoselective synthesis of (E)-ArCFCFR and (E)-ArCHCFR from ArCH(OH)CFBr2

Autor: Yoko Takebe, Tamejiro Hiyama, Manabu Kuroboshi, Nobuko Yamada

Publikováno v: Tetrahedron Letters. 36:6271-6274

( E )- vic -Difluoro olefin, RCFCFBr, was synthesized by dehydrobromination of RCFHCFBr 2 using lithium 2,2,6,6-tetramethylpiperidide. ( E )-Fluoro olefin, RCHCFBr, was obtained by treatment of RCH(OAc)CFBr 2 with EtMgBr and HN( i -Pr) 2 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c594734caf4e1e636f9459d0f453902d
https://doi.org/10.1016/0040-4039(95)01257-i

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