Výsledky vyhledávání

In-Situ Infrared Spectroscopy Analysis of Proton-Conducting Oxy-Hydroxides Ba(Zn, M)O2.9− Y (Oh)2 Y (M = Ta or W)

Autor: Kenji Arai, Yusuke Asai, Yoko Kokubo, Miwa Saito, Miki Inada, Katsuro Hayashi, Teruki Motohashi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::3a85e3d90237d81ea1f8183a3a8c7b28
https://doi.org/10.2139/ssrn.4330353

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In-situ infrared spectroscopy analysis of proton-conducting oxy-hydroxides Ba(Zn, M)O2.9−(OH)2 (M = Ta or W)

Autor: Kenji Arai, Yusuke Asai, Yoko Kokubo, Miwa Saito, Miki Inada, Katsuro Hayashi, Teruki Motohashi

Publikováno v: Journal of Solid State Chemistry. 323:124026

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::05e1183dba85d07edf887075a059eca4
https://doi.org/10.1016/j.jssc.2023.124026

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Stabilization of the Chemically Amplified Resist Process

Autor: Shuichi Miyata, Yasunori Hatakenaka, Yoko Kokubo, Nobuaki Santoh, Ikeda Yumiko, Akira Oikawa, Naomichi Abe

Publikováno v: Journal of Photopolymer Science and Technology. 8:519-524

We approached the problem of airborne chemical contamination from the processing side. By applying a very hydrophobic, polyolefinic coating resin, we completely eliminated T-tops. Patterning a resist in a low ammonia concentration also eliminated T-t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::5af42469c1f8ab9a3eda99ce3b7bb37e
https://doi.org/10.2494/photopolymer.8.519

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Ion interaction chromatography of nitrilotriacetatocomplexes of the rare earth elements with post-column reaction detection

Autor: Yoko Kokubo, Takeharu Wada, Rokuro Kuroda, Koichi Oguma

Publikováno v: Talanta. 40:237-241

The chromatographic behaviour of nitrilotriacetatocomplexes of the rare earth elements (Sc, Y and lanthanides) on a reversed phase ODS column has been investigated in the presence of 1-octane-sulphonate. There is a great difference in selectivity for

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e68a414f5b32892b5b3ac34786546502
https://doi.org/10.1016/0039-9140(93)80328-o

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Effect of reducing the contaminant concentration when patterning a chemically amplified positive resist

Autor: Ikeda Yumiko, Yasunori Hatakenaka, Naomichi Abe, Nobuaki Santoh, Akira Oikawa, Yoko Kokubo, Motoko Tanishima

Publikováno v: SPIE Proceedings.

We considered that contaminant control could best be addressed from the processing side. A KrF excimer stepper and a track system were physically integrated and equipped with chemical filter units. The atmosphere where wafers were transported from ex

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::4d526a307c8415449e23d321eee4f7bc
https://doi.org/10.1117/12.210383

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