Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Yoh Somemura"'
Autor:
Yasuko Y. Maruo, Yoh Somemura
Publikováno v:
Journal of Environmental Chemistry. 22:47-52
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bcffe1a0fc3a23f2e1eeebd963a49dc5
https://doi.org/10.5985/jec.22.47
https://doi.org/10.5985/jec.22.47
Autor:
Yoh Somemura
Publikováno v:
Optical Fiber Communication Conference.
ICTs are expected to reduce their own equipment and service energy consumption and mitigate GHG emissions through use of ICTs in other relevant sectors. Standardization activities of green ICTs in ITU-T will be outlined.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d57162f0788c92dce8708d5b15a94aeb
https://doi.org/10.1364/ofc.2010.otuo6
https://doi.org/10.1364/ofc.2010.otuo6
Publikováno v:
Japanese Journal of Applied Physics. 33:6389
A detailed analysis is performed to investigate the effects of mask contrast, mask-pattern size error and proximity gap on resolution and exposure dose margin for replicating 0.1-µm-region line-and-space (L&S) patterns using synchrotron radiation li
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::590f55dce495ccfd2a97a807077baa9a
https://doi.org/10.1143/jjap.33.6389
https://doi.org/10.1143/jjap.33.6389
Proximity Effect on Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography
Publikováno v:
Japanese Journal of Applied Physics. 33:6046
This paper reports the results of analyzing the proximity effect on the patterning characteristics for plural neighboring hole patterns in synchrotron radiation lithography. Fresnel diffraction simulation was used and pattern replication experiments
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::443c6ef6b5e2be39362018dad8c2a629
https://doi.org/10.1143/jjap.33.6046
https://doi.org/10.1143/jjap.33.6046
Publikováno v:
Japanese Journal of Applied Physics. 32:5971
This paper analyzes the influence of Fresnel diffraction on the patterning characteristics of isolated hole patterns in synchrotron radiation lithography by comparing Fresnel diffraction simulation extended to 2-dimensional patterns and pattern repli
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af1ec7f9aab5005ae74d999497dac505
https://doi.org/10.1143/jjap.32.5971
https://doi.org/10.1143/jjap.32.5971
Publikováno v:
Japanese Journal of Applied Physics. 31:4221
The effects of Fresnel diffraction on the patterning characteristics in synchrotron radiation lithography are greatly influenced by X-ray phase shift in the absorber, especially when a low-contrast X-ray mask is used. We show that the resolution in s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8105e9a7648f2fce16ba6467c5ac9a2a
https://doi.org/10.1143/jjap.31.4221
https://doi.org/10.1143/jjap.31.4221
Publikováno v:
Japanese Journal of Applied Physics. 31:3712
The characteristics of Ag-Se/Ge-Se are evaluated as a recording medium for soft X-ray holograms. An Ag-Se/Ge-Se film is feasible for real-time observation with high-resolution X-ray images because soft X-rays induce reflectance changes on this film w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::afd0a38e201400da853d259d2ca2d656
https://doi.org/10.1143/jjap.31.3712
https://doi.org/10.1143/jjap.31.3712
Autor:
Yoh Somemura, Kimiyoshi Deguchi
Publikováno v:
Japanese Journal of Applied Physics. 31:938
To investigate the influence of Fresnel diffraction on resolution and linewidth control in synchrotron radiation (SR) lithography, a detailed analysis is performed that takes X-ray phase shift in the absorber into account. The phase shift for 0.65-µ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b9db95fbcca255176851bfa543cf5279
https://doi.org/10.1143/jjap.31.938
https://doi.org/10.1143/jjap.31.938
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