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pro vyhledávání: '"Yinhwa Cheng"'
Autor:
Arase Takao, Hong-Ji Lee, Chih-Yuan Lu, Yuan-Chieh Chiu, Masahito Mori, Kuang-Chao Chen, Zusing Yang, Yinhwa Cheng, Hayato Watanabe, Li-Ian Wu, Sheng-Yuan Chang, Nan-Tzu Lian, Tahone Yang
Publikováno v:
2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Dependency of asymmetric etched profiles on open-ratio and pattern-size within the wafer was studied in a magnetic Very High Frequency (VHF) Plasma etching system for high aspect-ratio multiple alternating layers of silicon oxide/polysilicon (OP) etc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::01e90dde540c74658c87319af17b3e2a
https://doi.org/10.1109/asmc.2018.8373146
https://doi.org/10.1109/asmc.2018.8373146
