Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ying-Qi Shang"'
Publikováno v:
Micromachines, Vol 12, Iss 2, p 136 (2021)
Aimed at the problem of the small wet etching depth in sapphire microstructure processing technology, a multilayer composite mask layer is proposed. The thickness of the mask layer is studied, combined with the corrosion rate of different materials o
Externí odkaz:
https://doaj.org/article/258ad76ea06b4d5d9d425151614a9731
Autor:
Zhiyuan Liu, Zhiqiang Shao, Meiyu Yan, Shuang Wang, Erdong Song, Yalin Wu, Ying-Qi Shang, Chaozhu Zhang, Sun Zhiqiang
Publikováno v:
Optics Express. 29:4139
In this paper, we proposed an all-sapphire-based extrinsic Fabry-Perot interferometer (EFPI) pressure sensor based on an optimized wet etching process, aiming to improve the quality of the interference signal. The sapphire pressure sensitive diaphrag
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::29de32a1c46c13bf364cfaa3b578e8db
https://doi.org/10.1364/oe.417246
https://doi.org/10.1364/oe.417246
Publikováno v:
Modern Physics Letters B. 34:2050319
Aiming at the problem of heterogeneity of sealed cavity in silicon microstructure processing technology, the technology of preparing micro-cavity by using porous silicon sacrificial layer is proposed. The effect of current density on the preparation
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0711b87e16984caff05a411db02dc877
https://doi.org/10.1142/s0217984920503194
https://doi.org/10.1142/s0217984920503194
Autor:
Lin-Chao Zhang, Xiao-Long Jiang, Peng Zhang, Jing Chen, Hong Qi, Ying-Qi Shang, Ya-Lin Wu, Hai-Xin Xu, Yan Zhang, Yong Tong
Publikováno v:
Modern Physics Letters B. 33:1950092
Aiming at the problem of poor reliability of beam membrane fabrication in silicon microstructure processing technology, a technique for preparing microbeams using porous silicon sacrificial layer is proposed. The comparison of different porosity, dif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8bf2fb4e058c0f77bf369a6cb68de8d5
https://doi.org/10.1142/s0217984919500921
https://doi.org/10.1142/s0217984919500921
Publikováno v:
Journal of Physics: Conference Series. 986:012006
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ed5c99916a9d0e6f60649fdc68da7570
https://doi.org/10.1088/1742-6596/986/1/012006
https://doi.org/10.1088/1742-6596/986/1/012006
Publikováno v:
International Journal of Modern Physics B. 31:1741004
Aiming at the problem that sapphire surface roughness is quite large after wet etching in sapphire microstructure processing technology, we optimize the wet etching process parameters, study on the influences of concentration and temperature of etchi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::05d5ce667d1e72ce1f17c93ec8180fa4
https://doi.org/10.1142/s0217979217410041
https://doi.org/10.1142/s0217979217410041