Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Yelehanka Ramachandramurthy Pradeep"'
Autor:
Chin-Yu Chang, Yan-Ming Huang, Tzu-Hsuan Hsu, Yung-Hsiang Chen, Rakesh Chand, Yelehanka Ramachandramurthy Pradeep, Yens Ho, Ming-Huang Li, Weileun Fang, Sheng-Shian Li
Publikováno v:
2022 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium (EFTF/IFCS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5c2ae4f41e3f4c81e96be90eeac79de6
https://doi.org/10.1109/eftf/ifcs54560.2022.9850761
https://doi.org/10.1109/eftf/ifcs54560.2022.9850761
Autor:
Wu Ping Liu, Liang Choo Hsia, Chun Hui Low, Juan Boon Tan, Hai Cong, Xin Zhang, Yelehanka Ramachandramurthy Pradeep, Perera Chandima
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:1404-1409
In SiOCH (C-doped SiO2) via etch application, high polymer deposition chemistry is needed for better selectivity to both photoresist and underlying barrier materials. To prevent etch stop, high ion energy plasma is required to achieve a good process
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d33237f9829d7382898f05f18ee1f8b
https://doi.org/10.1116/1.2187990
https://doi.org/10.1116/1.2187990
Publikováno v:
2003 5th International Conference on ASIC. Proceedings (IEEE Cat. No.03TH8690).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d061493c2691c95b8703254757728bd1
https://doi.org/10.1109/issm.2003.1243305
https://doi.org/10.1109/issm.2003.1243305