Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Yejin Ku"'
Autor:
Hyun-Taek Oh, Gayoung Kim, Seok-Heon Jung, Yejin Ku, Jin-Kyun Lee, Kanghyun Kim, Byeong-Gyu Park, Sangsul Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Publikováno v:
ACS Omega, Vol 9, Iss 35, Pp 37365-37373 (2024)
Externí odkaz:
https://doaj.org/article/74a94f8cfe30485f82350a1cee891453
Autor:
Gayoung Kim, Sae-Eun Kang, Doo Hong Kim, Jong-In Won, Yejin Ku, Jongchan Son, Jin-Kyun Lee, Byung Jun Jung
Publikováno v:
Molecules, Vol 28, Iss 19, p 6784 (2023)
This article reports on the synthesis of materials containing both a fluoroalkyl group and a diazonaphthoquinone (DNQ) moiety as well as the fabrication of negative- and positive-tone stencil patterns. Additionally, the photoreaction mechanism that c
Externí odkaz:
https://doaj.org/article/5342d99883cd4920806a99906465ccae
Autor:
Anna Go, Sung Ryul Park, Yejin Ku, Mingge Sun, Sangho Yeon, Jin-Kyun Lee, Sang Wook Lee, Min-Ho Lee
Publikováno v:
Sensors, Vol 21, Iss 14, p 4902 (2021)
In this report, we present an enzyme deposited Au electrode for an electrochemical measurement of acetylacetic acid (AcAc) in urine. The electrode has an immobilized layer of a mixture of D-β-hydroxybutyrate dehydrogenase (HBDH) and nicotinamide ade
Externí odkaz:
https://doaj.org/article/4ee96fd0fc7d4d4b9e62d02d1a2bd817
Autor:
Keun-Woo Park, Seungsoo Choi, Yu Min Choi, Gayoung Kim, Yejin Ku, Jongchan Son, Jin-Kyun Lee, Byung Jun Jung, Myungwoong Kim
Publikováno v:
ACS Applied Polymer Materials. 5:3447-3456
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c1b606f5583a5121bfb4e914fce31a61
https://doi.org/10.1021/acsapm.3c00131
https://doi.org/10.1021/acsapm.3c00131
Autor:
Jeong-Seok Mun, Ji-Hoon Woo, Yejin Ku, Hyun-Taek Oh, Jin Hyun Lee, Jin-Kyun Lee, Kanghyun Kim, Byeong-Gyu Park, Sangsul Lee
Publikováno v:
ACS Materials Letters. 5:1164-1169
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::15da8adab0bb45a91e34ae75dd3db589
https://doi.org/10.1021/acsmaterialslett.2c01150
https://doi.org/10.1021/acsmaterialslett.2c01150
Autor:
Yejin Ku, KangHyun Kim, Hyun-Taek Oh, Byeong-Gyu Park, Sangsul Lee, Jin-Kyun Lee, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Publikováno v:
Langmuir. 39:3462-3470
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cd2576bb159dcc357d829379fa1cda6
https://doi.org/10.1021/acs.langmuir.2c03467
https://doi.org/10.1021/acs.langmuir.2c03467
Autor:
Yejin Ku, Han Bit Park, Gayoung Kim, Jin-kyun Lee, Jong-Won Lee, Byeong-Gyu Park, Sangsul Lee
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c9c04e7291e986ec667b52db395df1e3
https://doi.org/10.1117/12.2657982
https://doi.org/10.1117/12.2657982
Autor:
Yejin Ku, Hyungju Ahn, Jin-Kyun Lee, Jiho Kim, Byeong-Gyu Park, Sangsul Lee, Yu Ha Jang, Byung Jun Jung, Chawon Koh, Tsunehiro Nishi, Hyun-Woo Kim
Publikováno v:
Advances in Patterning Materials and Processes XL.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5cbee904fe3f172435009ca3e2e2580f
https://doi.org/10.1117/12.2658210
https://doi.org/10.1117/12.2658210
Autor:
Seok-Heon Jung, Yejin Ku, Hyun-Woo Kim, Kanghyun Kim, Hyun-Taek Oh, Yina Moon, Sangsul Lee, Tsunehiro Nishi, Jin-Kyun Lee, Jiyoul Lee, Byeong-Gyu Park, Do Hyeon Jeong, Cha-Won Koh
Publikováno v:
RSC Advances. 11:1517-1523
A highly fluorinated alternating polymer, P(RFMi-St), possessing improved thermal properties and patterning capabilities over perfluoroalkyl polymethacrylates under high energy radiation was achieved with semi-perfluorododecyl maleimide (RFMi) and st
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::de1d7ec391174f47e3683a34132f5948
https://doi.org/10.1039/d0ra08539a
https://doi.org/10.1039/d0ra08539a
Autor:
Kanghyun Kim, Jong-Won Lee, Byeong-Gyu Park, Hyun-Taek Oh, Yejin Ku, Jin-Kyun Lee, Geunbae Lim, Sangsul Lee
Publikováno v:
RSC advances. 12(5)
Investigations to evaluate the extreme ultraviolet (EUV) lithographic performance of 160 nm thick poly(methyl methacrylate) with 13.5 nm wavelength EUV light were performed using a synchrotron radiation source at Pohang Light Source-II (PLS-II). The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2f65fb9548b1b135ca5a9b8590ce0c11
https://pubmed.ncbi.nlm.nih.gov/35425284
https://pubmed.ncbi.nlm.nih.gov/35425284