Výsledky vyhledávání - "Yehya Haidar"

Theoretical study of the electronic structure of mono-bromide of lanthanum molecule including spin-orbit coupling effects

Autor: Yaman Hamade, Fadia Taher, Yehya Haidar, Ahmed Rhallabi

Publikováno v: Journal of Molecular Modeling
Journal of Molecular Modeling, Springer Verlag (Germany), 2019, 25 (8), ⟨10.1007/s00894-019-4114-4⟩

Among the family of lanthanide halides compounds, this work is devoted to the third halogen bromine. The presented lanthanum bromide LaBr molecule has a remarkable scientific interest regarding the other molecules because it presents few experimental

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2a737291b2fbf1799d685b8401b64f62
https://hal.archives-ouvertes.fr/hal-02272703

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Simulation of cryogenic silicon etching under SF 6 /O 2 /Ar plasma discharge

Autor: F. Roqueta, A. Mokrani, Yehya Haidar, Amand Pateau, Ahmed Rhallabi, F. Taher, Mohamed Boufnichel

Publikováno v: Journal of Vacuum Science and Technology A
Journal of Vacuum Science and Technology A, American Vacuum Society, 2016, 34 (6), ⟨10.1116/1.4966606⟩

An etching simulator is developed to study the two-dimensional (2D) silicon etch profile evolution under SF6/O2 inductively coupled plasma discharge. The simulator is composed of three modules: plasma kinetic module, sheath module, and etching module

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3b3e15af7fa932f67089a6478322e5f4
https://hal.archives-ouvertes.fr/hal-01723377

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SF6and C4F8global kinetic models coupled to sheath models

Autor: Amand Pateau, Yehya Haidar, F. Roqueta, F. Taher, Marie Claude Fernandez, Ahmed Rhallabi, Mohamed Boufnichel, A. Mokrani

Publikováno v: Plasma Sources Science and Technology. 23:065037

Global kinetic models combined with Monte Carlo sheath models are developed for SF6 and C4F8 plasma discharges for silicon etching under the Bosch process. In SF6 plasma, the dominant positive ions are , , and F+ while in C4F8 the dominant positive i

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::cbff3e1ac6b2b3b0491bfdb69bee77d9
https://doi.org/10.1088/0963-0252/23/6/065037

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Akademický článek

SF6 and C4F8 global kinetic models coupled to sheath models.

Autor: Yehya Haidar, Amand Pateau, Ahmed Rhallabi, Marie Claude Fernandez, Arezki Mokrani, Fadia Taher, Fabrice Roqueta, Mohamed Boufnichel

Publikováno v: Plasma Sources Science & Technology; Dec2014, Vol. 23 Issue 6, p1-1, 1p

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