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pro vyhledávání: '"Yefim Kil"'
Autor:
Edward C. Rea, Keith Hubbard, Luis A. Spinelli, Yefim Kil, Andrea Caprara, Alan Macleod, Stuart Butterworth, Colin Seaton, Tracy F. Thonn
Publikováno v:
SPIE Proceedings.
We report on the development and testing of a laser system that delivers up to 200 mW of continuous-wave radiation at 198.54 nm in a near diffraction-limited beam, to be used as a source for photolithography mask writing and mask inspection. The sour
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d9fb34188e96d0b7baf78b2f32314011
https://doi.org/10.1117/12.535669
https://doi.org/10.1117/12.535669
Publikováno v:
International Congress on Applications of Lasers & Electro-Optics.
As integrated circuitry becomes increasingly complex, the semiconductor industry continues to be driven towards the use of ever shorter exposure and inspection wavelengths to enable smaller feature sizes via optical lithography.This ongoing trend in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef4965ed76adfeb5b4c2f7743bf20187
https://doi.org/10.2351/1.5060137
https://doi.org/10.2351/1.5060137