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pro vyhledávání: '"Yea-Sen Lin"'
Autor:
Anuja De Silva, Shayak Banerjee, Alan J. Leslie, Kisup Chung, Hong Kry, Ranee Kwong, Dongbing Shao, Bidan Zhang, Yea-Sen Lin
Publikováno v:
SPIE Proceedings.
Challenges in block levels due to the dilemma of cost control and under-layer effects have been addressed in several papers already, and different approaches to solve the issue have been addressed. Among the known approaches, developable BARC and und
Autor:
Derren N. Dunn, Seiji Nakagawa, Yea-Sen Lin, Todd Bailey, Mohamed Talbi, Bidan Zhang, Takashi Murakami, Sajan Marokkey, Chandrasekhar Sarma, Dongbing Shao, Emily Gallagher
Publikováno v:
SPIE Proceedings.
To reduce cost, implant levels usually use masks fabricated with older generation mask tools, such as laser writers, which are known to introduce significant mask errors. In fact, for the same implant photolithography process, Optical Proximity Corre
Publikováno v:
SPIE Proceedings.
In this paper we report on alternate solutions to protect against process variability - while also focusing on minimizing simulation time. We have investigated a variety of techniques, including the use of aerial image parameters to flag sites that m