Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ye-Bin You"'
Autor:
Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Shin-Jae You
Publikováno v:
Nanomaterials, Vol 12, Iss 21, p 3798 (2022)
One of the cleaning processes in semiconductor fabrication is the ashing process using oxygen plasma, which has been normally used N2 gas as additive gas to increase the ashing rate, and it is known that the ashing rate is strongly related to the con
Externí odkaz:
https://doaj.org/article/045575d698d647b4aec66124a4abaf1e
Autor:
Si-jun Kim, In-ho Seong, Young-seok Lee, Chul-hee Cho, Won-nyoung Jeong, Ye-bin You, Jang-jae Lee, Shin-jae You
Publikováno v:
Sensors, Vol 22, Iss 15, p 5871 (2022)
As the conventional voltage and current (VI) probes widely used in plasma diagnostics have separate voltage and current sensors, crosstalk between the sensors leads to degradation of measurement linearity, which is related to practical accuracy. Here
Externí odkaz:
https://doaj.org/article/932ea57d62c34382adf6f1854152c408
Autor:
Si-jun Kim, Sang-ho Lee, Ye-bin You, Young-seok Lee, In-ho Seong, Chul-hee Cho, Jang-jae Lee, Shin-jae You
Publikováno v:
Sensors, Vol 22, Iss 15, p 5487 (2022)
As the importance of measuring electron density has become more significant in the material fabrication industry, various related plasma monitoring tools have been introduced. In this paper, the development of a microwave probe, called the measuremen
Externí odkaz:
https://doaj.org/article/a3833db2845441578bf753d363b77064
Autor:
Min-Su Choi, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Ye-Bin You, Byoung-Yeop Choi, You-Bin Seol, Shin Jae You
Publikováno v:
Applied Science and Convergence Technology. 32:54-57
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5d377d3e8250846f90f3ec9d1094178
https://doi.org/10.5757/asct.2023.32.2.54
https://doi.org/10.5757/asct.2023.32.2.54
Autor:
Ye-Bin You, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Byoung-Yeop Choi, Shin-Jae You
Publikováno v:
Applied Science and Convergence Technology. 31:103-106
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6180f278eebb9c674066941c457a3e3b
https://doi.org/10.5757/asct.2022.31.5.103
https://doi.org/10.5757/asct.2022.31.5.103
Publikováno v:
2010 2nd International Conference on E-business and Information System Security.
Sequence generation is a key technology in protocol robustness testing. WANG Le-chun proposed a robustness sequence generation algorithm based on FSM, but if the algorithm is directly used in EFSM, the test sequence may be unenforceable. For this pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69f9e7d4683b1980940cecf43b35f873
https://doi.org/10.1109/ebiss.2010.5473718
https://doi.org/10.1109/ebiss.2010.5473718