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Publikováno v:
In Thin Solid Films 21 May 1999 345(2):236-239
Publikováno v:
Wuhan University Journal of Natural Sciences. 10:525-528
Nanostructural zinc oxide films have been synthesized via vapor phase growth by heating pure zinc powder. Scanning electron microscopy (SEM) images and X-ray diffraction (XRD) results showed that four kinds of morphologies ZnO nanostructures namely n
Publikováno v:
Wuhan University Journal of Natural Sciences. 8:825-828
Arrays of silicon micro-tips were made by etching the p-type (1 0 0) silicon wafers which had SiO2 masks with alkaline solution. The density of the micro-tips is 2×104 cm−2. The Scanning Electron Microscope (SEM) photos showed that the tips in the
Publikováno v:
Wuhan University Journal of Natural Sciences. 8:821-824
CN x /SiCN composite films were prepared on titanium (Ti) alloy substrates by Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF-PECVD). As a buffer layer, SiCN ensured the adhesion of the CNx thin films on Ti substrates. X-ray diffraction
Publikováno v:
Wuhan University Journal of Natural Sciences. 8:829-832
SiCN thin films were synthesized by a radio frequency chemical vapor deposition (RFCVD) system on P-type Si (1 0 0) wafers using C2H4, SiH4 and N2 as raw materials, In order to get rid of the oxygen absorbed on the surface and improve the characteris
Publikováno v:
Wuhan University Journal of Natural Sciences. 4:41-44
Low energy hydrogen ion was used to passivate the electrically active defects existing in grains and grain boundaries of polycrystalline silicon solar cells. Short-circuit current of H+ implanted cells remarkably increased before and after preparing
Publikováno v:
Wuhan University Journal of Natural Sciences. 10:997-999
By heating pure zinc powder at low temperature, two kinds of ZnO nanostructures with different morphology and diameter were grown on silicon (1 0 0) substrates. Scanning electron microscopy images show that ZnO nanorods and ZnO nanowires have been ob
Publikováno v:
Chinese Physics Letters. 19:416-418
CNx thin films were prepared using low pressure plasma enhanced chemical vapour deposition, and then bombarded by low-energy N2+. The compositions before and after N2+ bombardment were compared using x-ray photoelectron spectroscopy. The electron fie