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pro vyhledávání: '"Yasuyuku Taniguchi"'
Autor:
Yasuyuku Taniguchi, Ulrich Egger, Gerhard Beitel, Kazuhiro Tomioka, Shigeki Sugimoto, Hiroyuki Kanaya, George Stojakovic, Rainer Bruchhaus, Haoren Zhuang
Publikováno v:
MRS Proceedings. 748
A 32 Mbit chain FeRAM™ stack with 0.20μm minimum feature size was etched with two subsequent lithography/RIE steps: in mask step 1 the platinum/SRO (strontium ruthenium oxide) top electrode and the PZT (lead zirconate titanate) layer, in mask step
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd2d71b2c1e5209b167e063a36979531
https://doi.org/10.1557/proc-748-u1.7
https://doi.org/10.1557/proc-748-u1.7
