Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Yasutaka Kikuchi"'
Publikováno v:
Nihon Bika Gakkai Kaishi (Japanese Journal of Rhinology). 34:334-339
Autor:
Isao Yonekura, Takayuki Nakamura, Jun Matsumoto, Hidemitsu Hakii, Tsutomu Murakawa, Yasushi Nishiyama, Masayuki Kuribara, Keishi Tanaka, Hiroshi Fukaya, Yasutaka Kikuchi, Toshimichi Iwai, Masashi Kawashita, Soichi Shida
Publikováno v:
SPIE Proceedings.
A new metrology method for CD-SEM has been developed to measure the side wall angle of a pattern on photomask. The height and edge width of pattern can be measured by the analysis of the signal intensity profile of each channel from multiple detector
Publikováno v:
SPIE Proceedings.
Influence of the prominent charging effect on the precision of measuring EUV mask features using CD-SEM was studied. The dimensions of EUV mask features continuously measured by CD-SEM gradually varied because of the charging. The charging effect on
Autor:
Takayuki Nakamura, Yasushi Nishiyama, Jun Matsumoto, Tsutomu Murakawa, Toshimichi Iwai, Hidemitsu Hakii, Yasutaka Kikuchi, Masayuki Kuribara, Keishi Tanaka, Isao Yonekura, Masashi Kawashita, Soichi Shida
Publikováno v:
SPIE Proceedings.
The Multiple Detector CD-SEM acquires the secondary electron from pattern surface at each detector. The 3D shape and height of mask patterns are generated by adding or subtracting signal profile of each detector. In signal profile of the differential
Publikováno v:
Nihon Kikan Shokudoka Gakkai Kaiho. 43:29-33
We encountered a very rare case of adult laryngeal anomaly accompanied by positional and morphological abnormalities of the hyoid bone and dysplasia of the strap muscle.The case was a 35-year-old female, and the major complaint was slight hoarseness.
Autor:
Yasutaka Kikuchi, Hideki Yasuda
Publikováno v:
Journal of the Visualization Society of Japan. 12:218-223
Autor:
Ken Racette, Louis Kindt, Alfred Wagner, Amy E. Zweber, Thomas B. Faure, Toru Komizo, Satoru Nemoto, Michael S. Hibbs, Yasutaka Kikuchi, Richard Wistrom, Emily Gallagher
Publikováno v:
Photomask Technology 2008.
During the development of optical lithography extensions for 32nm, both binary and attenuated phase shift Reticle Enhancement Technologies (RETs) were evaluated. The mask blank has a very strong influence on the minimum feature size and critical dime
Autor:
Steven C. Nash, Atsushi Kominato, Thomas B. Faure, Ken Racette, Yasutaka Kikuchi, Toshiyuki Suzuki, Louis Kindt, Richard Wistrom, Satoru Nemoto, Emily Gallagher, Yushin Sasaki, Toru Komizo
Publikováno v:
SPIE Proceedings.
As optical lithography is extended for use in manufacturing 45 nm devices, it becomes increasingly important to maximize the lithography process window and enable the largest depth of focus possible at the wafer stepper. Consequently it is very impor
Autor:
Ian Stobert, Yutaka Kodera, Emily Gallagher, Hidehiro Ikeda, Yasutaka Kikuchi, Mark Lawliss, Shinji Akima, Karen D. Badger
Publikováno v:
SPIE Proceedings.
The application of aggressive optical proximity correction (OPC) has permitted the extension of advanced lithographic technologies. OPC is also the source of challenges for th e mask-maker. Sub-resolution f eatures, small shapes between features and
Autor:
Satoru Nemoto, Takashi Haraguchi, Emily Gallagher, Yasutaka Kikuchi, Toru Komizo, Jason M. Benz, Michael S. Hibbs
Publikováno v:
SPIE Proceedings.
Three types of high transmission attenuated phase shift masks were evaluated. The attenuating materials were obtained from commercial and non-commercial sources. Various key performance metrics were investigated. Blanket film transmission and reflect