Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Yasunobu Someya"'
Autor:
Yasunobu Someya, Christopher J. Ellison, Lane Austin, C. Grant Willson, XiaoMin Yang, Yusuke Asano, Stephen M. Sirard, Gregory Blachut, Akhila Mallavarapu, Michael J. Maher
Publikováno v:
ACS Nano. 11:7656-7665
The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::db84c438e75d3eac63cd06b1ef14fd53
https://doi.org/10.1021/acsnano.7b02698
https://doi.org/10.1021/acsnano.7b02698
Autor:
William J. Durand, Stephen M. Sirard, Christopher M. Bates, Gregory Blachut, Yusuke Asano, Michael J. Maher, Roel Gronheid, Yasunobu Someya, Andrew M. Dinhobl, Christopher J. Ellison, Lane Austin, C. Grant Willson, Diane J. Hymes
Publikováno v:
Chemistry of Materials. 28:8951-8961
The directed self-assembly (DSA) of a 20 nm full-pitch silicon-containing block copolymer (BCP), poly(4-methoxystyrene-b-4-trimethylsilylstyrene), was performed using a process that produces shallow topography for hybrid chemo-/grapho-epitaxy. This h
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25eebcedcc1c1f753c3a0dd381954f8d
https://doi.org/10.1021/acs.chemmater.6b03633
https://doi.org/10.1021/acs.chemmater.6b03633
Autor:
Yasunobu Someya, C. Grant Willson, Gregory Blachut, Stephen M. Sirard, Yusuke Asano, Michael J. Maher, Lane Austin, Christopher J. Ellison
Publikováno v:
Journal of Photopolymer Science and Technology. 29:701-704
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e1b04980c602d779761a311bd965275
https://doi.org/10.2494/photopolymer.29.701
https://doi.org/10.2494/photopolymer.29.701
Autor:
Nakajima Makoto, Rikimaru Sakamoto, Yasunobu Someya, Satoshi Takeda, Shibayama Wataru, Shigaki Shuhei, Tamura Mamoru
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
EUV lithography has been desired as the leading technology for below Hp20nm. However, the source power, masks and resist materials still have critical issues for mass production. Especially in resist materials, RLS trade-off is the key issue. To over
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2048044c9a09479d703dacfa6147da0a
https://doi.org/10.1117/12.2503298
https://doi.org/10.1117/12.2503298
Autor:
Jan Doise, Geert Vandenberghe, XiaoMin Yang, Yasunobu Someya, C. Grant Willson, Christopher J. Ellison, Lane Austin, Stephen M. Sirard, Natsuko Ito, Mizuochi Ryuta, Paulina Rincon-Delgadillo, Gregory Blachut
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
We have developed block co-polymers (BCPs) in which one of the blocks incorporates silicon and the other does not [1]. These materials provide access to BCPs with high Flory-Huggins interaction parameters (χ) and dry etch selectivity under reactive
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::62076a22725b19d017abcdbe6a0de743
https://doi.org/10.1117/12.2299966
https://doi.org/10.1117/12.2299966
Autor:
Yasunobu Someya, Hiroyuki Wakayama, Shinsuke Tadokoro, Masami Kozawa, Mizuochi Ryuta, Rikimaru Sakamoto
Publikováno v:
SPIE Proceedings.
Directed Self-Assembly (DSA) process is one of the attractive processes for creating the very fine pitch pattern. In this technology, block-co-polymer is the key material to achieve a fine patterning. Many reports are published with Polystyrene-b-Pol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4c60416f7418c1b4e3748e0314fd2f80
https://doi.org/10.1117/12.2258145
https://doi.org/10.1117/12.2258145
Autor:
Gregory Blachut, Emir Gurer, Grant Willson, Christopher J. Ellison, Diane J. Hymes, Kazunori Mori, David B. Graves, William J. Durand, Michael J. Maher, Yusuke Asano, Stephen M. Sirard, Dustin W. Janes, Yasunobu Someya, L. Azarnouche
Publikováno v:
SPIE Newsroom.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e2bae1b1a3a18d6ab659a4791e5a2fcd
https://doi.org/10.1117/2.1201603.006351
https://doi.org/10.1117/2.1201603.006351
Autor:
Emir Gurer, Michael J. Maher, Gregory Blachut, C. Grant Willson, David B. Graves, L. Azarnouche, Christopher J. Ellison, Stephen M. Sirard, William J. Durand, Yasunobu Someya, Yusuke Asano, Kazunori Mori, Dustin W. Janes, Diane J. Hymes
Publikováno v:
SPIE Proceedings.
The directed self-assembly (DSA) of block copolymers offers a promising route for scaling feature sizes below 20 nm. At these small dimensions, plasmas are often used to define the initial patterns. It is imperative to understand how plasmas interact
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3cea1c064d5d4bd43d4eff628328dc7b
https://doi.org/10.1117/12.2220305
https://doi.org/10.1117/12.2220305
Publikováno v:
SPIE Proceedings.
Neutral layer (NL) material is one of the key materials for aligning block-co-polymer (BCP). In this study, NLs were designed and investigated, which have the capability to enhance the photo-lithography performance, a good alignment performance of BC
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ccb63c1ca0d2eeeda18f818395a3d96
https://doi.org/10.1117/12.2219005
https://doi.org/10.1117/12.2219005
Autor:
Isao Azumaya, Yasunobu Someya, Shigeo Kohmoto, Keiki Kishikawa, Hyuma Masu, Kentaro Yamaguchi, Yu Kuroda
Publikováno v:
Crystal Growth & Design. 9:3457-3462
As a new supramolecular tecton based on hydrogen bonding for crystal engineering, benzoic acid derivatives possessing two hydroxymethyl groups were developed and their crystal structures were investigated by single crystal X-ray analysis. The hydroge
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::274cb55860114ed337d23f4f4c2ad216
https://doi.org/10.1021/cg9000347
https://doi.org/10.1021/cg9000347