Zobrazeno 1 - 10
of 26
pro vyhledávání: '"Yasumasa Kawabe"'
Publikováno v:
SID Symposium Digest of Technical Papers. 45:24-27
We have developed a novel photosensitive organic insulator for high definition FPD applications. This material has excellent features: ultrahigh sensitivity, fine patterns formation, excellent transparency and out-gas properties. Meanwhile, a photose
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2da2cd37405535cb444d9621518b1ef2
https://doi.org/10.1002/j.2168-0159.2014.tb00007.x
https://doi.org/10.1002/j.2168-0159.2014.tb00007.x
Autor:
Yasumasa Kawabe
Publikováno v:
The Proceedings of the Space Engineering Conference. :17-20
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::81b924e85f590768e86dd4a201fbc477
https://doi.org/10.1299/jsmesec.2006.15.17
https://doi.org/10.1299/jsmesec.2006.15.17
Autor:
Fumiyuki Nishiyama, Tsukasa Yamanaka, Kenichiro Sato, Kunihiko Kodama, Tadayoshi Kokubo, Makoto Momota, Shinnichi Kanna, Shiro Tan, Yasumasa Kawabe, Hyou Takahashi
Publikováno v:
Journal of Photopolymer Science and Technology. 17:501-509
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59cdbb9f08884529bb1b9087551f9609
https://doi.org/10.2494/photopolymer.17.501
https://doi.org/10.2494/photopolymer.17.501
Autor:
Shinichi Kanna, Morio Yagihara, Tadayoshi Kokubo, Sanjay Malik, Kazuyoshi Mizutani, Stephanie Dilocker, Shoichiro Yasunami, Shiro Tan, Yasumasa Kawabe
Publikováno v:
Journal of Photopolymer Science and Technology. 16:595-600
Resist materials for 157 nm lithography is believed to be one of the key technology for producing patterns below 70 nm. Many different types of fluorine-containing polymer platforms have been energetically pursued by a number of researchers, and some
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::55a78a6d6a8c309d577af5bfc9fda176
https://doi.org/10.2494/photopolymer.16.595
https://doi.org/10.2494/photopolymer.16.595
Autor:
Yasumasa Kawabe, Shiro Tan, Larry Ferreira, Sanjay Malik, Allyn Whewell, Murrae J. Bowden, Tadayoshi Kokubo, Tori Fujimori, Jeff Eisele
Publikováno v:
Journal of Photopolymer Science and Technology. 13:507-512
The outgassing issues that have long plagued conventional acetal resist designs are shown to be significantly mitigated depending on the structure of the acetal-blocked polymer. Resists formulated with acetal-blocked polymers based on low molecular w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cab3bccebd158d86bc850cc73cfcb5d5
https://doi.org/10.2494/photopolymer.13.507
https://doi.org/10.2494/photopolymer.13.507
Autor:
Lawrence Ferreira, Toru Fujimori, Allyn Whewell, Veerle Van Driessche, Brian Maxwell, Kazuya Uenishi, Thomas R. Sarubbi, Yasumasa Kawabe, Toshiaki Aoai, Tadayoshi Kokubo, Andrew J. Blakeney, Murrae J. Bowden, Shiro Tan, Sanjay Malik
Publikováno v:
Journal of Photopolymer Science and Technology. 12:591-600
Physical and lithographic properties of structurally diverse acetal-derivatized hydroxy styrene polymers are reported. The dissolution and thermal properties of the acetal-blocked-polymers vary with the size of the pendent acetal moiety. The lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ed89aa9bd6cb9b41e7a0844fb651a16
https://doi.org/10.2494/photopolymer.12.591
https://doi.org/10.2494/photopolymer.12.591
Autor:
Morio Yagihara, Kenichiro Sato, Hajime Nakao, Kunihiko Kodama, Yasumasa Kawabe, Toshiaki Aoai
Publikováno v:
Journal of Photopolymer Science and Technology. 12:477-486
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7501930e09420e3df7b631b283851247
https://doi.org/10.2494/photopolymer.12.477
https://doi.org/10.2494/photopolymer.12.477
Autor:
Shuuji Hirano, Kazuyoshi Mizutani, Yasumasa Kawabe, Yasutomo Kawanishi, Shoichiro Yasunami, Seiya Masuda, Sou Kamimura
Publikováno v:
SPIE Proceedings.
In case of EUV lithography, resist material needs to be developed to improve high sensitivity and to minimize outgassing. The outgassing segments from resist were mainly from PAG decomposition. The new type PAG was synthesized by modifying cation gro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9d4f777d3b454bff3400db1b84c1fd3a
https://doi.org/10.1117/12.656238
https://doi.org/10.1117/12.656238
Autor:
Kazuyoshi Mizutani, Hiromi Kanda, Kei Yamamoto, Shinichi Kanna, Shinji Tarutani, Kazuyuki Kitada, Shinji Uno, Haruki Inabe, Yasumasa Kawabe
Publikováno v:
SPIE Proceedings.
The interfacial mass transfer issues of resist components in ArF immersion lithography were investigated both for topcoat resist system and for non-topcoat resist system. PAGs and photoacids are known for the major components that leach out from the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::381b2c5334a58523d628636d21697c01
https://doi.org/10.1117/12.600490
https://doi.org/10.1117/12.600490
Autor:
Yasumasa Kawabe, Makoto Momota, Shinichi Kanna, Kunihiko Kodama, Fumiyuki Nishiyama, Tadayoshi Kokubo, Kenichiro Sato, Hyou Takahashi, Shiro Tan, Tsukasa Yamanaka
Publikováno v:
SPIE Proceedings.
Transparency of the resist film at exposure wavelength affects lithographic performances, such as sensitivity, profile and resolution. Not only binder polymer, but also photo acid generator (PAG) itself has a significant impact on transparency of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dae3c3e7ddb9c59c5405b038db5cd40f
https://doi.org/10.1117/12.538049
https://doi.org/10.1117/12.538049