Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Yasuhiro Tanimura"'
Publikováno v:
IEEJ Transactions on Fundamentals and Materials. 135:598-604
Autor:
Yasuhiro Tanimura, Koji Ohta
Publikováno v:
The Journal of The Institute of Electrical Engineers of Japan. 131:80-83
Publikováno v:
IEEJ Transactions on Fundamentals and Materials. 125:1017-1022
Publikováno v:
Environment Control in Biology. 30:9-15
蛍光ランプと床面の距離 (ランプ高さ) を数十cmに近接させ内面を白色塗装 (反射率0.8) し, 反射光を有効に利用した近接照明の特性を調べ, 以下の知見を得た.(1) 照明率 (成育室の光利用効
Autor:
Yoshitaka Kawaai, Yoshinori Anzai, Shigeki Nakayama, Kenji Esaki, Kenzo Iwao, Akira Ikeda, Yasuhiro Tanimura
Publikováno v:
JOURNAL OF THE ILLUMINATING ENGINEERING INSTITUTE OF JAPAN. 76:523-529
Publikováno v:
Shokubutsu Kojo Gakkaishi. 3:111-123
Autor:
Kenji Ezaki, Yasuhiro Tanimura, Yositaka Kawaai, Akira Ikeda, Kenzo Iwao, Shigeki Nakayama, Hiroyuki Kageyama
Publikováno v:
Environment Control in Biology. 29:89-93
These studies were carried out for the development of non-invasive and continuous moni-toring technique of plant growth in the plant factories.In this kind of facilities, the environmental factors such as ambient temperature, relative humidity, light
Autor:
Shigeki Nakayama, Yoshitaka Kawaai, Kenzo Iwao, Akira Ikeda, Kenji Ezaki, Yasuhiro Tanimura, Hiroyuki Kageyama
Publikováno v:
Environment Control in Biology. 29:81-88
Autor:
Watanabe Kensuke, Gaku Oinuma, Yasutaka Inanaga, Yoichiro Tabata, Masaki Kuzumoto, Yasuhiro Tanimura
Publikováno v:
Journal of Physics D: Applied Physics. 43:255202
The surface recombination of nitrogen atoms on various materials was investigated at atmospheric pressure. The afterglows of pure nitrogen discharge are injected into a surface loss test unit, whose path wall is composed of the materials to be examin
Autor:
Yoichiro Tabata, Yasuhiro Tanimura, Yasutaka Inanaga, Watanabe Kensuke, Seiji Noda, Masaki Kuzumoto, Gaku Oinuma
Publikováno v:
Journal of Physics D: Applied Physics. 41:155204
A method has been developed for real-time measurement of nitrogen atom density in atmospheric pressure post-discharge flows. In this method, nitric oxide is supplied to the downstream of a nitrogen discharge as a reactant. Our chemical simulation has