Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Yasuhiro Kishikawa"'
Publikováno v:
The Proceedings of the National Symposium on Power and Energy Systems. :73-76
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5fda974aa87ab5c313edf76bd7020a3
https://doi.org/10.1299/jsmepes.2011.16.73
https://doi.org/10.1299/jsmepes.2011.16.73
Autor:
Tokuyuki Honda, Akinori Ohkubo, Minoru Yoshii, Miyoko Kawashima, Yuichi Iwasaki, Yasuhiro Kishikawa
Publikováno v:
SPIE Proceedings.
As the resolution of optical lithography is being pushed for 45-nm half-pitch node, there is a growing concern about the printing capability of chemically amplified resists. The chemical amplification involves photoacid diffusion that causes contrast
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::17ad0bd24027f99d532affecaf77e015
https://doi.org/10.1117/12.656123
https://doi.org/10.1117/12.656123
Autor:
Akiyoshi Suzuki, Yoshiyuki Sekine, Yuichi Iwasaki, Miyoko Kawashima, Akinori Ohkubo, Yasuhiro Kishikawa, Kenji Yamazoe, Tokuyuki Honda
Publikováno v:
Optical Microlithography XVIII.
As imaging properties of ArF Immersion optics are evaluated in a hyper-NA region, the polarization of illumination systems and vectorial mask diffraction play an important role. We investigate the effectiveness of polarized illumination for practical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c828b352a698dbbd4e3ad2f6e3c08a97
https://doi.org/10.1117/12.600500
https://doi.org/10.1117/12.600500
Publikováno v:
SPIE Proceedings.
Precise in-situ transmission testing is necessary for evaluation of materials to be used in lithography systems, which use light source at the wavelength of 157 nm. Fluorine (F2) excimer lasers have pulse-to-pulse energy variation (< 9 %, 3 sigma, fr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8a48ea5d990bdd8c4482f60455f1cb3
https://doi.org/10.1117/12.506614
https://doi.org/10.1117/12.506614
Autor:
Toyohiko Yatagai, Tokuyuki Honda, Minoru Yoshii, Miyoko Kawashima, Yasuhiro Kishikawa, Yuichi Iwasaki, Seiji Takeuchi, Akinori Ohkubo
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 8:013003
For lithography of 45-nm half-pitch and beyond, the resist blur due to photoacid diffusion is a significant issue. On the other hand, it has been generally recognized that there is a trade-off between resist resolution and sensitivity. We study the i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a113fd41f157cf6c7a6c580b4de008fc
https://doi.org/10.1117/1.3059551
https://doi.org/10.1117/1.3059551
Autor:
Akinori Ohkubo, Miyoko Kawashima, Minoru Yoshii, Tokuyuki Honda, Yuichi Iwasaki, Yasuhiro Kishikawa
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 5:043004
The chemical amplification provides high sensitivity of resists for deep-uv and extreme-uv (EUV) lithography. On the other hand, the chemical amplification involves photoacid diffusion that causes contrast degradation of the latent image or, in other
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::524375d30831cf9410b3047fe3b19642
https://doi.org/10.1117/1.2397018
https://doi.org/10.1117/1.2397018
Autor:
Minoru Yoshii, Yasuhiro Kishikawa, Yuichi Iwasaki, Akinori Ohkubo, Miyoko Kawashima, Seiji Takeuchi, Tokuyuki Honda, Toyohiko Yatagai
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Jan2009, Vol. 8 Issue 1, p013003-013003-8, 1p