Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Yasiel Cabrera"'
Autor:
Yves J. Chabal, Rezwanur Rahman, Manuel de Anda Villa, Yuri N. Gartstein, Aaron Dangerfield, Benoy Anand, Sara M. Rupich, Anton V. Malko, Yasiel Cabrera, Ryan Shaw
Publikováno v:
Nanoscale. 9:8695-8702
Integration of colloidal nanocrystal quantum dots (NQDs) with strongly absorbing semiconductors offers the possibility of developing optoelectronic and photonic devices with new functionalities. We examine the process of energy transfer (ET) from pho
Autor:
Hong-Cai Zhou, Kévin Cocq, Hala Assi, Yasiel Cabrera, Liang Feng, Jérémy Cure, Timo Thonhauser, Jean François Veyan, Stephanie Jensen, Sunah Kwon, Massimo Catalano, Moon J. Kim, Hao Wang, Jing Li, Yves J. Chabal, Kui Tan, Guoyu Zhang, Eric C. Mattson, Peng Zhang, Shuai Yuan
Publikováno v:
Journal of Materials Chemistry A
Journal of Materials Chemistry A, 2019, 29, pp.17536-17546. ⟨10.1039/c8ta12334a⟩
Journal of Materials Chemistry A, Royal Society of Chemistry, 2019, pp.17536-17546. ⟨10.1039/c8ta12334a⟩
Journal of Materials Chemistry A, 2019, 29, pp.17536-17546. ⟨10.1039/c8ta12334a⟩
Journal of Materials Chemistry A, Royal Society of Chemistry, 2019, pp.17536-17546. ⟨10.1039/c8ta12334a⟩
International audience; Gold nanoparticles (NPs) exhibit optical, catalytic, and physical properties that are scientifically fascinating and essential for many applications. However, the challenge is to synthesize and disperse ultra-small and highly
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::18dfad3b72a6de1512d1eaf01f4d0402
https://hal.laas.fr/hal-02185685
https://hal.laas.fr/hal-02185685
Autor:
Eric C. Mattson, Yves J. Chabal, Yasiel Cabrera, Yuxuan Wang, Thomas J. L. Mustard, Mathew D. Halls, Sara M. Rupich, Kolade A. Oyekan, Michael C. Martin, Hans A. Bechtel
Publikováno v:
Chemistry of Materials, vol 30, iss 17
Mattson, EC; Cabrera, Y; Rupich, SM; Wang, Y; Oyekan, KA; Mustard, TJ; et al.(2018). Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning. Chemistry of Materials, 30(17), 6192-6206. doi: 10.1021/acs.chemmater.8b03149. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/6b88b021
Mattson, EC; Cabrera, Y; Rupich, SM; Wang, Y; Oyekan, KA; Mustard, TJ; et al.(2018). Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning. Chemistry of Materials, 30(17), 6192-6206. doi: 10.1021/acs.chemmater.8b03149. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/6b88b021
Copyright © 2018 American Chemical Society. The potential implementation of extreme ultraviolet (EUV) lithography into next generation device processing is bringing urgency to identify resist materials that optimize EUV lithographic performance. Ino
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f9436793959dded0e1fafd62b546a9a7
https://escholarship.org/uc/item/6b88b021
https://escholarship.org/uc/item/6b88b021
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
The chemical structure and thermal reactivity of recently discovered inorganic-organic hybrid resist materials are characterized using a combination of in situ and ex situ infrared (IR) spectroscopy and x-ray photoemission spectroscopy (XPS). The mat
Publikováno v:
ECS Meeting Abstracts. :1217-1217
High absorption metal and main group oxide nanoclusters have recently become the subject of intense investigation due to their potential as alternatives to conventional organic chemically amplified photoresists for negative tone patterning in the ext