Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Yannick Loquet"'
Autor:
Christopher J. Waskiewicz, Hideyuki Tomizawa, Muthumanickam Sankarapandian, Mignot Yann, Marcy Beard, Chiahsun Tseng, Yannick Loquet, Terry A. Spooner, Philip L. Flaitz, Eric G. Liniger, Shyng-Tsong Chen, James Hsueh-Chung Chen, Bryan Morris, Walter Kleemeier
Publikováno v:
Microelectronic Engineering. 107:138-144
In the attempts to push the resolution limits of 193nm immersion lithography, this work demonstrates the building of 3 metal level 56nm pitch copper dual-damascene interconnects, using Negative-Tone Development Lithography-Etch-Lithography-Etch (LELE
Autor:
Jérôme Coussement, Pierre Guinedor, Rachid Taalat, A. Kerlain, Laurent Rubaldo, Marie-Lise Bourqui, Vincent Chaffraix, Yannick Loquet, Alexandre Brunner, Diane Sam-giao, Péré-Laprene Nicolas, L. Dargent
Publikováno v:
Infrared Technology and Applications XLII.
SOFRADIR is the worldwide leader on the cooled IR detector market for high-performance space, military and security applications thanks to a well mastered Mercury Cadmium Telluride (MCT) technology, and recently thanks to the acquisition of III-V tec
Autor:
Pierre Guinedor, A. Kerlain, Vincent Chaffraix, Laurent Rubaldo, L. Dargent, Diane Sam-giao, Nicolas Péré-Laperne, Marie-Lise Bourqui, Jocelyn Berthoz, Jérôme Coussement, Alexandre Brunner, Rachid Taalat, Yannick Loquet
Publikováno v:
SPIE Proceedings.
SOFRADIR is the worldwide leader on the cooled IR detector market for high-performance space, military and security applications thanks to a well mastered Mercury Cadmium Telluride (MCT) technology, and recently thanks to the acquisition of III-V tec
Publikováno v:
ECS Transactions. 3:1-8
The emergence of wireless communication technologies has increased the need for high performance radio frequency (RF) circuits as transceivers or filters (1). These functions imply high quality factor (Q) inductors. One way to reach such high Q value
Autor:
Sohan Singh Mehta, Yunpeng Yin, Yannick Loquet, Chiahsun Tseng, Peggy Lawson, Chen Jim C, Shinichiro Kawakami, Dave Hetzer, Sean D. Burns, Matthew E. Colburn, Mark Kelling, Vikrant Chauhan, Lior Huli, Shyng-Tsong Chen, Jerome Wandell, Guillaume Landie, Martin Glodde, Bassem Hamieh, Chiew-seng Koay, Yongan Xu, Shannon Dunn, Alvin G. Thomas, John C. Arnold, Terry A. Spooner, Jeong Soo Kim, Yuyang Sun, Martin Burkhardt, David V. Horak, Hirokazu Kato, Yoshinori Matsui, Jason Cantone, Mignot Yann
Publikováno v:
SPIE Proceedings.
The objective of this work is to describe the advances in 193nm photoresists using negative tone developer and key challenges associated with 20nm and beyond technology nodes. Unlike positive tone resists which use protected polymer as the etch block
Publikováno v:
ECS Meeting Abstracts. :1142-1142
not Available.