Zobrazeno 1 - 10
of 21
pro vyhledávání: '"Yannick Bourgin"'
Publikováno v:
Journal of the European Optical Society-Rapid Publications, Vol 17, Iss 1, Pp 1-13 (2021)
Abstract Polarizing beamsplitters have numerous applications in optical systems, such as systems for freeform surface metrology. They are classically manufactured from birefringent materials or with stacks of dielectric coatings. We present a binary
Externí odkaz:
https://doaj.org/article/1ebbcbc449194b87b51fbb29a632a292
Publikováno v:
Laser Beam Shaping XVIII.
Laser welding by means of multi-kilowatt solid state lasers can be considerably improved if the focused welding spot is embedded in a pre-heating spot generated e.g. by an additional laser. To improve the compactness of the optical system, the same f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11b69619f4eee68955ce428f653577ff
https://doi.org/10.1117/12.2320579
https://doi.org/10.1117/12.2320579
Mask aligner lithography is a well-established back-end fabrication process in microlithography. Within the last few years, resolution enhancement techniques have been transferred and adapted from projection lithography to further develop mask aligne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::91745411faffeb0d9510e50c781c67eb
https://publica.fraunhofer.de/handle/publica/250693
https://publica.fraunhofer.de/handle/publica/250693
Publikováno v:
32nd European Mask and Lithography Conference.
Photomasks contain geometric information that will be transferred to substrates or pre-structured surfaces. Conventional mask aligner lithography in the sense of shadow printing of the photomask suffers from limited achievable resolution. Photomask a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aff26e6598acfd8fe20be40b3200a044
https://doi.org/10.1117/12.2248545
https://doi.org/10.1117/12.2248545
Publikováno v:
Nanophotonics VI.
Mask-aligner (MA) lithography is a well-known method for the fabrication of micrometer sized structures on a substrate with a diameter up to 300 mm. In spite of a theoretical resolution below 200 nm, the minimum printable feature sized remained above
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::081e01581314aba7c275adf3bf94bf1a
https://doi.org/10.1117/12.2227129
https://doi.org/10.1117/12.2227129
Publikováno v:
SPIE Proceedings.
Diffractive mask-aligner lithography allows printing sub-micrometer resolution structures by using non-contact mode. For such a purpose, binary diffraction gratings are used as masks and are designed to transmit solely the ±1st diffraction orders. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7efc7901d7c98bfa284d538aa5e3b938
https://doi.org/10.1117/12.2218610
https://doi.org/10.1117/12.2218610
Publikováno v:
SPIE Proceedings.
Modern optical applications have special demands on the lithographic fabrication technologies. This relates to the lateral shape of the structures as well as to their three dimensional surface profile. On the other hand optical nano-structures are of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::066ec444718de204afb790cf33ca8cb2
https://doi.org/10.1117/12.2222028
https://doi.org/10.1117/12.2222028
Publikováno v:
SPIE Proceedings.
Diffractive mask-aligner lithography is capable to print structures that have a sub-500-nanometer resolution by using non-contact mode. This requires the use of specially designed phase-masks and dedicated illumination conditions in the Mask-Aligner
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::85c8965554395d59d2f4c9242b4fb401
https://doi.org/10.1117/12.2085777
https://doi.org/10.1117/12.2085777
Autor:
Adriana Szeghalmi, Ernst-Bernhard Kley, Thomas Käsebier, Pascal Genevée, Thomas Siefke, Uwe D. Zeitner, Yannick Bourgin
Diffractive mask-aligner lithography allows printing structures that have a sub-micrometer resolution by using non-contact mode. For such a purpose, masks are often designed to operate with monochromatic linearly polarized light, which is obtained by
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4eba54c9eb88cca0a9d4e7b782ac9d06
https://publica.fraunhofer.de/handle/publica/240837
https://publica.fraunhofer.de/handle/publica/240837
Autor:
Ernst-Bernhard Kley, Yannick Bourgin, Daniel Voigt, Thomas Käsebier, Thomas Siefke, Uwe D. Zeitner
Publikováno v:
Optics Letters. 42:3816
We report the fabrication of periodic structures with a critical dimension of 90 nm on a fused silica substrate by i-line (λ=365 nm) proximity mask-aligner lithography. This realization results from the combination of the improvements of the optical
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca4be00e1c649c434c9c3f5281bb7abe
https://doi.org/10.1364/ol.42.003816
https://doi.org/10.1364/ol.42.003816