PMIPK-azide dry-developable resist in electron beam lithography.

Autor: Tsuda, Minoru, Oikawa, Setsuko, Yabuta, Mitsuo, Yakota, Akira, Nakane, Hisashi, Yamashita, Kazuhiro, Gamo, Kenji, Namba, Susumu

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics Processing & Phenomena; 1985, Vol. 3 Issue 2, p481-484, 4p