Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Ya-Mi Chuang"'
Publikováno v:
Polymer Chemistry. 6:6488-6497
The use of photo-induced copper-mediated radical polymerization (photoCMP) to synthesize mixed acrylate/methacrylate (methyl acrylate, MA and methyl methacrylate, MMA) block copolymers is investigated. Reactions in which only one type of ligand (Me6T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22c2a6887bb77cc3790efccea37d448c
https://doi.org/10.1039/c5py00592b
https://doi.org/10.1039/c5py00592b
Publikováno v:
ACS Macro Letters. 3:732-737
Photoinitiated copper-mediated radical polymerization offers an one-pot and time efficient method of preparing a decablock copolymer PMA-PtBA-PMA-PDEGA-PMA-PtBA-PMA-PDEGA-PnBA-PDEGA with an overall molecular weight of 8500 g·mol–1. The molecular w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2a24fedafb6fc954ecf5cc3e72f2f0fb
https://doi.org/10.1021/mz5003867
https://doi.org/10.1021/mz5003867
Publikováno v:
Advanced Functional Materials. 23:173-183
Nanoscale surface roughness is an important factor in determining the properties of surfaces and can affect the performance of a range of devices prepared by lithographic methods. Here, a method is reported, which enables modulation of the nanoscale
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::71d58f6263b08d9a85f90f749acde951
https://doi.org/10.1002/adfm.201200564
https://doi.org/10.1002/adfm.201200564
Autor:
Andrew K. Whittaker, Yong Keng Goh, Paul Zimmerman, Kirsten Jean Lawrie, Lan Chen, Ya-Mi Chuang, Idriss Blakey, Emil Piscani
Publikováno v:
Radiation Physics and Chemistry. 80:242-247
The use of norbornene-based polysulfones as non-chemically amplified resists (non-CARs) for 193 nm immersion lithography was explored. Allylbenzene was incorporated into the polymer backbone to increase the absorbance of the polymers. The effect of p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e7ce36423995f20d66a35bf034310e6
https://doi.org/10.1016/j.radphyschem.2010.07.040
https://doi.org/10.1016/j.radphyschem.2010.07.040
Autor:
Tim R. Dargaville, Richard Hoogenboom, Brooke L. Farrugia, Ya-Mi Chuang, Jodie N. Haigh, Paul D. Dalton
Publikováno v:
Macromolecular rapid communications. 37(1)
A new method for fabricating hydrogels with intricate control over hierarchical 3D porosity using microfiber porogens is presented. Melt electrospinning writing of poly(e-caprolactone) is used to create the sacrificial template leading to hierarchica
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::28c27955b8f97e8edaa607b81d48e5b2
https://pubmed.ncbi.nlm.nih.gov/26474191
https://pubmed.ncbi.nlm.nih.gov/26474191
Publikováno v:
Alternative Lithographic Technologies V.
Overcoming the resolution-LER-sensitivity trade-off is a key challenge for the development of novel resists and processes that are able to achieve the ITRS targets for future lithography nodes. Here, we describe a process that treats lithographic pat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cf892ebc172ce716affaa0d92f2fa40e
https://doi.org/10.1117/12.2012488
https://doi.org/10.1117/12.2012488
Autor:
Han-Hao Cheng, Andrew K. Whittaker, Imelda Keen, Todd R. Younkin, Anguang Yu, Idriss Blakey, Michael J. Leeson, Kevin S. Jack, Ya-Mi Chuang
Publikováno v:
Alternative Lithographic Technologies IV.
Directed self assembly (DSA) of block copolymers is an emerging technology for achieving sub-lithographic resolution. We investigate the directed self assembly of tw o systems, polystyrene-block-poly-DL-lactic acid (PS- b-PDLA) and PS-b-poly(methyl m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69b7b75a9e5b29e2869cb0ac8ab8f0e1
https://doi.org/10.1117/12.916744
https://doi.org/10.1117/12.916744
Autor:
Llewellyn Rintoul, Ya-Mi Chuang, Aaron S. Micallef, Zul Merican, Kevin S. Jack, Idriss Blakey
Publikováno v:
Physical chemistry chemical physics : PCCP. 14(10)
Understanding the interactions of small molecules with gold nanoparticles is important for controlling their surface chemistry and, hence, how they can be used in specific applications. The interaction of iodoperfluorobenzene compounds with gold nano
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fbd829d515dd271f9ea2842913168d1e
https://pubmed.ncbi.nlm.nih.gov/22314792
https://pubmed.ncbi.nlm.nih.gov/22314792
Electron beam induced freezing of positive tone, EUV resists for directed self assembly applications
Autor:
Andrew K. Whittaker, Han-Hao Cheng, Imelda Keen, Idriss Blakey, Todd R. Younkin, Anguang Yu, Ya-Mi Chuang, Kevin S. Jack, Michael J. Leeson
Publikováno v:
Alternative Lithographic Technologies III.
The commercialization of 32 nm lithography has been made possible by using double patterning, a technique that allows for an increased pattern density, potentially, through resist freezing and high precision pattern registration. Recent developments
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5c9a5a119697df57e85be9eff85a377
https://doi.org/10.1117/12.881491
https://doi.org/10.1117/12.881491
Autor:
Andrew K. Whittaker, Ya-Mi Chuang, Emil Piscani, Paul A. Zimmerman, Lan Chen, Idriss Blakey, Kirsten Jean Lawrie, Yong Keng Goh
Publikováno v:
Advances in Resist Materials and Processing Technology XXVI.
Initial studies are presented on the use of polysulfones as non-chemically amplified resists (non-CARs) for 193 nm immersion lithography. Polynorbornene sulfone films on silicon wafers have been irradiated with 193 nm photons in the absence of a phot
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de7606b1e1e25060f1445c89466f5807
https://doi.org/10.1117/12.814076
https://doi.org/10.1117/12.814076