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pro vyhledávání: '"Y. Iishibashi"'
Autor:
Yumiko H. Nishimura, Takanari Ouchi, Takayuki Homma, Takahiro Akiyoshi, Tetsuo Nishida, Y. Iishibashi, Jason Komadina, Y. Nakano, Yasuhiro Fukunaka
Publikováno v:
ECS Transactions. 41:9-15
Electrodeposition of Si has gained interest recently due to the relative simplicity of electrochemical processing over conventional methods of Si deposition. In this report, we present our progress in the development of Si nanowire arrays electrodepo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1a7d76331ffafd599db4addfa276baf2
https://doi.org/10.1149/1.4729177
https://doi.org/10.1149/1.4729177
