Zobrazeno 1 - 10
of 69
pro vyhledávání: '"Xuema Li"'
Autor:
Martin Foltin, Xia Sheng, Brent Buchanan, Darrin Miller, John Paul Strachan, Le Zheng, James S. Ignowski, Can Li, Sai Rahul Chalamalasetti, Xuema Li, Lennie Kiyama, Catherine Graves, Matthew P. Hardy, Si-Ty Lam, Wen Ma
Publikováno v:
IEEE Transactions on Nanotechnology. 18:963-970
We propose memristor-based TCAMs (Ternary Content Addressable Memory) circuits to accelerate Regular Expression (RegEx) matching through in memory processing of finite automata. RegEx matching is a key function in network security to find malicious a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ddf2fb30f5985e3829912776c3ad2f67
https://doi.org/10.1109/tnano.2019.2936239
https://doi.org/10.1109/tnano.2019.2936239
Autor:
Lennie Kiyama, Le Zheng, Si-Ty Lam, Wen Ma, Xia Sheng, Martin Foltin, Brent Buchanan, John Paul Strachan, Catherine Graves, Sai Rahul Chalamalasetti, Xuema Li, Matthew P. Hardy
Publikováno v:
ICRC
Regular expression (RegEx)matching is a key function in network security, where matching of packet data against known malicious signatures filters and alerts against active network intrusions. RegExs are widely used in open source and commercial netw
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5773e7d834cafaee066c2fffdfb36adc
https://doi.org/10.1109/icrc.2018.8638603
https://doi.org/10.1109/icrc.2018.8638603
Autor:
Sai Rahul Chalamalasetti, Matthew P. Hardy, Le Zheng, Xia Sheng, Catherine Graves, Martin Foltin, Brent Buchanan, Si-Ty Lam, Xuema Li, Wen Ma, John Paul Strachan, Lennie Kiyama
Publikováno v:
NANOARCH
We propose using memristor-based TCAMs (Ternary Content Addressable Memory) to accelerate Regular Expression (RegEx) matching. RegEx matching is a key function in network security, where deep packet inspection finds and filters out malicious actors.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::801659688431558a6afd7e72052ee3d0
https://doi.org/10.1145/3232195.3232201
https://doi.org/10.1145/3232195.3232201
Publikováno v:
Applied Physics A. 121:443-449
In this review, we describe the use of nanoimprint lithography in our group to fabricate plasmonic platforms with nanometer-scale critical features that would be significantly more expensive using other fabrication techniques: 3-D cones that have tip
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::540f2a7ed9be57c2f390ab4d21bcff4d
https://doi.org/10.1007/s00339-015-9073-8
https://doi.org/10.1007/s00339-015-9073-8
Autor:
Gun Young Jung, Xuema Li, Shih-Yuan Wang, Wei Wu, Peng Lin, Zhiyong Li, Qiangfei Xia, R. Stanley Williams, Shuang Pi, Yong Chen
Publikováno v:
Applied Physics A. 121:467-479
Memristive devices are promising building blocks for enhanced CMOS hardware in data storage and computing. Nanoimprint lithography (NIL) has been an enabling technology in the past decade for exploring novel devices and circuits. In this paper, the a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3bc5afda4ef28f76eeacdfad088310fd
https://doi.org/10.1007/s00339-015-9038-y
https://doi.org/10.1007/s00339-015-9038-y
Autor:
Xuema Li, Xue Huang, Marco Fiorentino, Chong Zhang, Geza Kurczveil, Jiaming Zhang, Di Liang, Raymond G. Beausoleil
Publikováno v:
2017 IEEE Photonics Conference (IPC).
We demonstrate a heterogeneous microring resonator with integrated InP-dielectric-Si metal-oxide-semiconductor (MOS) capacitor by high-k dielectric wafer bonding. HfO 2 is used for its extremely high k value (20–30) and enables optical tuning range
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f2023fcced534638277ea79944ac38d5
https://doi.org/10.1109/ipcon.2017.8116031
https://doi.org/10.1109/ipcon.2017.8116031
Autor:
Le Zheng, Can Li, Si-Ty Lam, Catherine Graves, Xia Sheng, Xuema Li, John Paul Strachan, Suhas Kumar, Brent Buchanan
Publikováno v:
Advanced Electronic Materials. 5:1800876
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2f30de6cba92f1586b762d5eec0d5b19
https://doi.org/10.1002/aelm.201800876
https://doi.org/10.1002/aelm.201800876
Publikováno v:
Applied Physics A. 106:767-772
Nanoimprint lithography is a high-resolution, high-throughput and cost-effective nanopatterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc846b6e45718f0e04655b9fcb70db9f
https://doi.org/10.1007/s00339-012-6775-z
https://doi.org/10.1007/s00339-012-6775-z
Publikováno v:
Applied Physics A. 105:261-266
We fabricated and measured the far-field optical properties of a sub-wavelength Si3N4 (silicon nitride) two dimensional grating. Frequency-dependent transmission measurements from a white-light source revealed that both transverse magnetic (TM) and t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c86c30666ef19f5492d337b84b2c714
https://doi.org/10.1007/s00339-011-6613-8
https://doi.org/10.1007/s00339-011-6613-8
Autor:
Matthew D. Pickett, R. Stanley Williams, Jianhua Yang, Wei Wu, Qiangfei Xia, Gilberto Medeiros-Ribeiro, Xuema Li
Publikováno v:
Advanced Functional Materials. 21:2660-2665
The logical relationship between two previously defined “memory resistors” is revealed by constructing and experimentally demonstrating a three-terminal memistor equivalent circuit using two two-terminal memristors. A technique is then presented,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ba69b631b24eb3dd2a0a47f856f9c7b
https://doi.org/10.1002/adfm.201100180
https://doi.org/10.1002/adfm.201100180