Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Xu Genbao"'
Publikováno v:
In Pattern Recognition July 2024 151
Autor:
Jiang, Zhuo-Rui, Li, Yuxin, Zhang, Deyun, Zhou, Yu-Xiao, Xu, Genbao, Wang, Changhua, Lan, Yeqing, Guo, Jing
Publikováno v:
In Journal of Hazardous Materials 15 September 2021 418
Publikováno v:
In Surface & Coatings Technology 15 May 2019 365:2-9
Publikováno v:
In Thin Solid Films 1 November 2018 665:109-116
Publikováno v:
In Thin Solid Films 30 August 2018 660:840-845
Autor:
Peng, Shou, Yao, Tingting, Yang, Yong, Zhang, Kuanxiang, Jiang, Jiwen, Jin, Kewu, Li, Gang, Cao, Xin, Xu, Genbao, Wang, Yun
Publikováno v:
In Physica B: Physics of Condensed Matter 15 December 2016 503:111-116
Autor:
Peng, Shou, Yang, Yong, Li, Gang, Jiang, Jiwen, Jin, Kewu, Yao, TingTing, Zhang, Kuanxiang, Cao, Xin, Wang, Yun, Xu, Genbao
Publikováno v:
In Journal of Alloys and Compounds 5 September 2016 678:355-359
Publikováno v:
Surface and Coatings Technology. 365:2-9
Negative oxygen (O−) ions in the sputter deposition of oxides play a non-negligible role in determining their structures as well as physical properties. Knowledge of bombardment by O− ions induced local disorder in magnetron sputtered ZnO: Al (AZ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::32a6fe1d699340c04b0034fd51c8d4ea
https://doi.org/10.1016/j.surfcoat.2018.04.013
https://doi.org/10.1016/j.surfcoat.2018.04.013
Publikováno v:
Thin Solid Films. 665:109-116
Spatial distribution of highly energetic negative ions inherent in magnetron sputtering of oxides has long made low temperature deposition unsuitable for high quality films uniform over relatively large areas. Here we examine the distributions of str
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fcbdbcc7063325ab6772bad39aee4852
https://doi.org/10.1016/j.tsf.2018.08.047
https://doi.org/10.1016/j.tsf.2018.08.047
Publikováno v:
Thin Solid Films. 660:840-845
In magnetron sputtered oxide thin films, both the structure and physical properties are affected by bombardment-induced defects and their annihilation. Ga-doped zinc oxide (GZO) films with low Ga content (~1.7 at.%) were magnetron sputtered at variou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a9ecff46ab6af81df640d94e0565d3aa
https://doi.org/10.1016/j.tsf.2018.03.019
https://doi.org/10.1016/j.tsf.2018.03.019