Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Xiong Bang Wei"'
Publikováno v:
Medžiagotyra, Vol 21, Iss 2, Pp 187-190 (2015)
Enhanced terahertz (THz) absorption of NiCr film deposited on a dielectric substrate has been proven by applying a reactive ion etching (RIE) treatment to the dielectric film. Nano – scale nickel – chromium (NiCr) thin films are deposited on RIE
Externí odkaz:
https://doaj.org/article/0521339e62d44733b1e55b67a061d4d0
Publikováno v:
Medžiagotyra, Vol 21, Iss 2, Pp 187-190 (2015)
Enhanced terahertz (THz) absorption of NiCr film deposited on a dielectric substrate has been proven by applying a reactive ion etching (RIE) treatment to the dielectric film. Nano – scale nickel – chromium (NiCr) thin films are deposited on RIE
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f34b6e2b5b7285412c810fd917695e07
http://matsc.ktu.lt/index.php/MatSc/article/view/6131
http://matsc.ktu.lt/index.php/MatSc/article/view/6131
Publikováno v:
Advanced Materials Research. 909:91-94
A high selectivity patterning technology of vanadium oxide (VOx) thin film was suggested in this paper. VOxthin film was etched through a photoresist (PR) mask using Cl/N based gases in a reactive ion etching (RIE) system. Taguchi method was used for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b8116dab99c6e3e3f4d1a4efabd1d67e
https://doi.org/10.4028/www.scientific.net/amr.909.91
https://doi.org/10.4028/www.scientific.net/amr.909.91
Publikováno v:
Advanced Materials Research. 529:53-58
Series resistance in solar cell is known to be one of the key factors which need to be optimized, especially through the design of the front pattern. This paper is the utilization of the improved diode and series resistance model to represent the sol
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::afa4e09df640109d5e95081dcfd2a982
https://doi.org/10.4028/www.scientific.net/amr.529.53
https://doi.org/10.4028/www.scientific.net/amr.529.53
Publikováno v:
SPIE Proceedings.
Patterning of AlCu alloy thin films is a key technology in MEMS fabrication. In this paper, reactive ion etching (RIE) process of Al-1%Cu films was described using BCl3 and Cl2 as etching gases and N2 and CH4 as neutral gases. A four-step process was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3632de219f06ecf4bf8d3e1192e0bde3
https://doi.org/10.1117/12.2042642
https://doi.org/10.1117/12.2042642