Zobrazeno 1 - 10
of 28
pro vyhledávání: '"Xinlu Deng"'
Autor:
Shuai Chen, Kaiming Hu, Shuzhen Yan, Tianjiao Ma, Xinlu Deng, Wenming Zhang, Jie Yin, Xuesong Jiang
Publikováno v:
Chinese Science Bulletin. 68:296-297
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5caf1299fa7b1a7b0e467d665846f2ed
https://doi.org/10.1360/tb-2022-1259
https://doi.org/10.1360/tb-2022-1259
Autor:
Shuai Chen, Kaiming Hu, Shuzhen Yan, Tianjiao Ma, Xinlu Deng, Wenming Zhang, Jie Yin, Xuesong Jiang
Publikováno v:
Science bulletin. 67(21)
Regulating metal surfaces with micro-/nanoscale structures is of great significance for both material science and potential applications. However, the intrinsic properties of metals, such as fixed isotropic moduli and inflexible structures, in a sens
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f94683a7284f88ba6705a9402bb8f289
https://pubmed.ncbi.nlm.nih.gov/36545994
https://pubmed.ncbi.nlm.nih.gov/36545994
Publikováno v:
In Surface & Coatings Technology 2006 200(16):4918-4922
Publikováno v:
In Vacuum 2002 65(3):353-359
Publikováno v:
Thin Solid Films. 518:2077-2081
Hydrogen-free amorphous silicon nitride (SiNx) films were deposited at room temperature by microwave electron cyclotron resonance plasma-enhanced unbalance magnetron sputtering. Varying the N2 flow rate, SiNx films with different properties were obta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1cc77e7b53557df791ef29818969f64
https://doi.org/10.1016/j.tsf.2009.07.191
https://doi.org/10.1016/j.tsf.2009.07.191
Advances in DLC coatings by hybrid PSII and PECVD as a barrier to corrosion in simulated body fluid*
Publikováno v:
Journal of Materials Science. 40:5603-5608
In this study, diamond-like carbon (DLC) films were deposited on biomedical AISI316L stainless steel by hybrid plasma source ion implantation (PSII) and plasma-enhanced chemical vapour deposition (PECVD). Potentiodynamic polarization tests and Electr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::44f908a01fbb78ab2194694d982cc05c
https://doi.org/10.1007/s10853-005-1426-9
https://doi.org/10.1007/s10853-005-1426-9
Publikováno v:
Journal of Manufacturing Science and Engineering. 128:175-179
Temperature plays a vital role in the machining industry today. With increasing cutting speeds being used in machining operations, the thermal aspects of cutting have become more important. A nickel-chrome versus nickel-silicon thin-film thermocouple
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96bb0c14aa528890fd91017c8f7a49cb
https://doi.org/10.1115/1.2117467
https://doi.org/10.1115/1.2117467
Publikováno v:
Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy. 58:1915-1922
Measurements of rotational temperature as low as several hundred Kelvin have been measured using optical emission spectroscopy (OES) in nitrogen direct current (DC) glow discharge. The strongest band of the first negative system of nitrogen was chose
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0f9f3c90197325e4c6598be2e062f374
https://doi.org/10.1016/s1386-1425(01)00658-8
https://doi.org/10.1016/s1386-1425(01)00658-8
Publikováno v:
International Journal of Modern Physics B. 16:1120-1126
Emission spectra from the ECR plasma enhanced magnetron sputtering discharge used for CNx film deposition were investigated in the wavelength range 350 – 550 nm. The optical emission spectra from both the negative glow discharge zone near the targe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e87c54616c561a4a1d972b8982a720b5
https://doi.org/10.1142/s021797920201097x
https://doi.org/10.1142/s021797920201097x
Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering
Publikováno v:
Thin Solid Films. 390:107-112
The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da0d0448f9a731ea1df2b017a16390a9
https://doi.org/10.1016/s0040-6090(01)00926-9
https://doi.org/10.1016/s0040-6090(01)00926-9