Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Xing Lan Liu"'
Publikováno v:
IEEE Access, Vol 11, Pp 127974-127986 (2023)
The Failure Mode Effect Analysis process (FMEA) is widely used in industry for risk assessment, as it effectively captures and documents domain-specific knowledge. This process is mainly concerned with causal domain knowledge. In practical applicatio
Externí odkaz:
https://doaj.org/article/b36cb1dd64394b6f87c07783cad62233
State of the art performances for entity extraction tasks are achieved by supervised learning, specifically, by fine-tuning pretrained language models such as BERT. As a result, annotating application specific data is the first step in many use cases
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6562057c01fe23a6f88f93f1a1ab637f
Publikováno v:
Sichuan da xue xue bao. Yi xue ban = Journal of Sichuan University. Medical science edition. 51(2)
To investigate the effect of miR-503-5p on the proliferation, invasion, migration and epithelialization of cervical cancer HeLa cells via targetingFour ccervical cancer HeLa cells groups were set up including control group, mimic-NC group, miR-503-5p
Autor:
Xing Lan Liu, Auguste Lam, Manuel Giollo, Dimitra Gkorou, Richard Johannes Franciscus Van Haren
Publikováno v:
33rd European Mask and Lithography Conference.
Process optimization depends largely on field engineer’s knowledge and expertise. However, this practice turns out to be less sustainable due to the fab complexity which is continuously increasing in order to support the extreme miniaturization of
Autor:
Anne Pastol, Maxime Gatefait, Xing Lan Liu, Jean Massin, Frank Sundermann, Hakki Ergun Cekli, Jan Beltman, Emilie Dupre La Tour, Richard Johannes Franciscus Van Haren
Publikováno v:
SPIE Proceedings.
The on-product overlay specification and Advanced Process Control (APC) are getting extremely challenging particularly after the introduction of multi-patterning applications like Litho-Etch-Litho-Etch (LELE). While the Reticle Writing Error (RWE) co
Publikováno v:
Proceedings of SPIE; 10/10/2017, Vol. 10446, p1-8, 8p
Autor:
Anne Pastol, Xing Lan Liu, Pierre Jerome Goirand, Richard Johannes Franciscus Van Haren, Auguste Lam, Maxime Gatefait, Jan Beltman, B. Le-Gratiet, Maya Angelova Doytcheva
Publikováno v:
SPIE Proceedings.
The continuous need for lithography overlay performance improvement is a key point for advanced integrated circuit manufacturing. Overlay control is more and more challenging in the 2x nm process nodes regarding functionality margin of the chip and t
A double quantum dot is formed in a graphene nanoribbon device using three top gates. These gates independently change the number of electrons on each dot and tune the inter-dot coupling. Transport through excited states is observed in the weakly cou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6a448dd6349552195613634dd04b9e5b