Zobrazeno 1 - 10
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pro vyhledávání: '"Xia, ChaoChao"'
Autor:
Zhang, Hanying, Zhao, Qianwen, Jiang, Baiqing, Wang, Yuan, Xie, Tunan, Lou, Kaihua, Xia, ChaoChao, Bi, C.
The discovery of spin-orbit torques (SOTs) generated through the spin Hall or Rashba effects provides an alternative write approach for magnetic random-access memory (MRAM), igniting the development of spin-orbitronics in recent years. Quantitative c
Externí odkaz:
http://arxiv.org/abs/2401.02967
Autor:
Zhao, Qianwen, Zhu, Yingmei, Zhang, Hanying, Jiang, Baiqing, Wang, Yuan, Xie, Tunan, Lou, Kaihua, Xia, ChaoChao, Yang, Hongxin, Bi, C.
The discoveries of two-dimensional ferromagnetism and magnetic semiconductors highly enrich the magnetic material family for constructing spin-based electronic devices but with an acknowledged challenge that the Curie temperature (Tc) is usually far
Externí odkaz:
http://arxiv.org/abs/2309.06204
Autor:
Zhao, Qianwen, Xia, ChaoChao, Zhang, Hanying, Jiang, Baiqing, Xie, Tunan, Lou, Kaihua, Bi, Chong
The discovery of ferromagnetism in two-dimensional (2D) monolayers has stimulated growing research interest in both spintronics and material science. However, these 2D ferromagnetic layers are mainly prepared through an incompatible approach for larg
Externí odkaz:
http://arxiv.org/abs/2302.00553
Autor:
Lou, Kaihua, Xie, Tunan, Zhao, Qianwen, Jiang, Baiqing, Xia, ChaoChao, Zhang, Hanying, Yao, Zhihong, Bi, Chong
Fabrication of perpendicularly magnetized ferromagnetic films on various buffer layers, especially on numerous newly discovered spin-orbit torque (SOT) materials to construct energy-efficient spin-orbitronic devices, is a long-standing challenge. Eve
Externí odkaz:
http://arxiv.org/abs/2208.14913
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Akademický článek
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Autor:
Zhao, Qianwen, Xia, ChaoChao, Zhang, Hanying, Jiang, Baiqing, Xie, Tunan, Lou, Kaihua, Bi, Chong
Publikováno v:
ACS Applied Nano Materials; 2/24/2023, Vol. 6 Issue 4, p2873-2882, 10p
Akademický článek
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Akademický článek
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Autor:
Zhao Q; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China., Zhu Y; National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China.; Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China., Zhang H; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China., Jiang B; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China., Wang Y; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China., Xie T; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China., Lou K; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China., Xia C; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; School of Microelectronics, University of Science and Technology of China, Hefei 230026, China., Yang H; National Laboratory of Solid State Microstructures, School of Physics, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, China.; Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China., Bi C; Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China.; University of Chinese Academy of Sciences, Beijing 100049, China.; School of Microelectronics, University of Science and Technology of China, Hefei 230026, China.
Publikováno v:
ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2023 Oct 04; Vol. 15 (39), pp. 46520-46526. Date of Electronic Publication: 2023 Sep 22.