Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Xavier Multone"'
Publikováno v:
ECS Transactions. 25:1093-1098
The deposition of amorphous alumina (Al2O3) films on four inch wafers with high deposition rate (up to 50 nm/min) by an advanced HV-CVD technique is discussed. Amorphous nature of the films is confirmed by X-ray diffraction. Refractive index of the d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0cb7d3d2124179e9bd1a14f8ce170148
https://doi.org/10.1149/1.3207711
https://doi.org/10.1149/1.3207711
Publikováno v:
ECS Transactions. 25:1087-1092
A laser or electron beam assisted deposition in HV-CVD conditions was used in order to achieve structured amorphous alumina (Al2O3) deposits. Selective deposition of Al2O3 in the irradiated regions has been demonstrated. We investigate the influence
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eb50dff319f330cf36af155e3e5f6da2
https://doi.org/10.1149/1.3207710
https://doi.org/10.1149/1.3207710
Publikováno v:
Applied Physics Letters. 88:031906
Freestanding deposits are grown on a silicon cantilever from a precursor gas by an electron induced process. Deposit mass determination is performed with an atomic force microscopy setup, where the cantilever resonance frequency shift, resulting from
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::322cb77258badcdf47a31423e4cc706a
https://doi.org/10.1063/1.2158516
https://doi.org/10.1063/1.2158516