Zobrazeno 1 - 10
of 92
pro vyhledávání: '"X. Z. Yao"'
Autor:
J A, Li, Y L, Xu, N, Ding, Y, Ji, L X, Liu, S X, Rao, Y Q, Zhang, X Z, Yao, Y, Fan, C, Huang, Y H, Zhou, L L, Wu, Y, Dong, L, Zhang, Y F, Rong, T T, Kuang, X F, Xu, L, Liu, D S, Wang, D Y, Jin, W H, Lou, W C, Wu
Publikováno v:
Zhonghua wai ke za zhi [Chinese journal of surgery]. 60(7)
Autor:
J A, Li, W C, Wu, Y, Ji, L X, Liu, S X, Rao, D S, Wang, Y Q, Zhang, X Z, Yao, Y, Fan, C, Huang, Y H, Zhou, W H, Lou
Publikováno v:
Zhonghua wai ke za zhi [Chinese journal of surgery]. 57(12)
Publikováno v:
Orthopaedics & Traumatology: Surgery & Research. 102:533-534
Akademický článek
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Autor:
Shing-Chow Chan, X. Z. Yao
Publikováno v:
VCIP
This paper proposed a new convex-optimization-based two-pass rate control method for object coding of China's audio video coding standard (AVS). The algorithm adopts a two-pass methodology to overcome the important interdependency problem between rat
Publikováno v:
ISCAS
An AVS- and object- based coding approach to support scalable coding of plenoptic videos (PVs) is proposed. PVs are simplified dynamic light fields in which the videos are taken at regularly spaced locations along line segments, which can provide a c
Publikováno v:
Journal of Materials Research. 14:3196-3199
A (110)-oriented diamond film was deposited by hot filament chemical vapor deposition with H2 and CH4 separately introduced into the reactive zone. The film with a degree of orientation I(220)/I(111) of more than 200% and deposition rate of 2–3 μm
Akademický článek
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Observations of Quasiperiodic Transition to Frequency Locking in Electron Cyclotron Resonance Plasma
Autor:
D. Y. Jiang, X. Z. Yao
Publikováno v:
Physical Review Letters. 79:5014-5017
The temporal evolution of plasma oscillations as microwave power changes is analyzed in an electron cyclotron resonance plasma. A first frequency f(1) appears at an input microwave power P-i = 600 W, then at P-i = 650 W a second frequency f(2), much
Autor:
D. Y. Jiang, X. Z. Yao
Publikováno v:
Journal of Applied Physics. 81:2119-2123
The sheath potential φM is calculated from the difference between the plasma potential and the floating potential. The plasma potential has been measured by using a retarding field analyzer with an entrance slit located in front of it. The electron