Characterization of Line Edge Roughness (LER) Propagation from Resist: Underlayer Interfaces in Ultra-thin Resist Films

Autor: George, Simi, Naulleau, Patrick, Wu, Se Yu, Kennedy, Joseph, Xie, Song Yuan, Flanigan, Kyle, Wallow, Thomas

Publikováno v: George, Simi; Naulleau, Patrick; Wu, Se Yu; Kennedy, Joseph; Xie, Song Yuan; Flanigan, Kyle; et al.(2010). Characterization of Line Edge Roughness (LER) Propagation from Resist: Underlayer Interfaces in Ultra-thin Resist Films. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/368224mq

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______325::442dd1dd3304516f2a96b062157bdc2a
http://www.escholarship.org/uc/item/368224mq