Zobrazeno 1 - 10
of 107
pro vyhledávání: '"Woo‐Hee Kim"'
Autor:
Prithwish Goswami, Sung Yeon Cho, Jin Hyun Park, Woo Hee Kim, Hyun Jin Kim, Myoung Hyeon Shin, Han Yong Bae
Publikováno v:
Nature Communications, Vol 13, Iss 1, Pp 1-13 (2022)
The α-tertiary amine functional group is an essential structure of diverse naturally occurring alkaloids and pharmaceuticals. Here the authors show an efficient water-accelerated organocatalytic method to access α-tertiary amines incorporating homo
Externí odkaz:
https://doaj.org/article/f16565f4dc0a4c4b887bd8a9b2ee988f
Autor:
Yujin Lee, Kangsik Kim, Zonghoon Lee, Hong-Sub Lee, Han-Bo-Ram Lee, Woo-Hee Kim, Il-Kwon Oh, Hyungjun Kim
Publikováno v:
Chemistry of Materials. 35:2312-2320
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::935b2dc93f86808db8bba29e886a63ef
https://doi.org/10.1021/acs.chemmater.2c02862
https://doi.org/10.1021/acs.chemmater.2c02862
Autor:
Jae Chan Park, Chang Ik Choi, Sang-Gil Lee, Seung Jo Yoo, Ji-Hyun Lee, Jae Hyuck Jang, Woo-Hee Kim, Ji-Hoon Ahn, Jeong Hwan Kim, Tae Joo Park
Publikováno v:
Journal of Materials Chemistry C. 11:1298-1303
A HfO2 film was grown using discrete feeding ALD, an advanced ALD process designed to improve the surface coverage of the precursor, which decreased the residual impurities in the film and increased the film density.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eec33e7b0762b19649ddf2b074826ebe
https://doi.org/10.1039/d2tc03485a
https://doi.org/10.1039/d2tc03485a
Publikováno v:
Journal of Materials Chemistry C. 11:3743-3750
Electric-potential-assisted atomic layer deposition was demonstrated for Ru film growth. Surface reaction was modified via the electric potential, which affected the nucleation and microstructure of films. Assorted film properties were improved notab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5591f0a7472d763d91567c8f18d5a07f
https://doi.org/10.1039/d2tc04755a
https://doi.org/10.1039/d2tc04755a
Autor:
Min-Ji Ha, Hyunchang Kim, Jeong-Hun Choi, Miso Kim, Woo-Hee Kim, Tae Joo Park, Bonggeun Shong, Ji-Hoon Ahn
Publikováno v:
Chemistry of Materials. 34:2576-2584
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5a45f427823236e258af6f9319fb84ee
https://doi.org/10.1021/acs.chemmater.1c03607
https://doi.org/10.1021/acs.chemmater.1c03607
Autor:
Tae Joo Park, Woo Hee Kim, Bonggeun Shong, Deok-Yong Cho, Dae Hyun Kim, Jae Chan Park, Jeongwoo Park, Ji-Hoon Ahn
Publikováno v:
Chemistry of Materials. 33:4099-4105
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::706bb0c18cd4216aed561af7ae78656b
https://doi.org/10.1021/acs.chemmater.1c00729
https://doi.org/10.1021/acs.chemmater.1c00729
Publikováno v:
Chemistry of Materials. 32:9696-9703
Selective atomic layer deposition (ALD) using surface-controlled reactivity is attracting a great deal of attention as a simple bottom-up patterning process that can provide both continued dimensio...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8444a241959a83849f53316bb7385607
https://doi.org/10.1021/acs.chemmater.0c03372
https://doi.org/10.1021/acs.chemmater.0c03372
Publikováno v:
Materials Letters. 333:133574
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2458524bc1f6a1f2bb3c887a441efd2f
https://doi.org/10.1016/j.matlet.2022.133574
https://doi.org/10.1016/j.matlet.2022.133574
Publikováno v:
Materials Letters. 328:133187
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b6290d3e89b1aa457510c8a67183eb80
https://doi.org/10.1016/j.matlet.2022.133187
https://doi.org/10.1016/j.matlet.2022.133187
Publikováno v:
Chemical Engineering Journal. 446:136951
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5283848d4c370e83e03be585b4c18222
https://doi.org/10.1016/j.cej.2022.136951
https://doi.org/10.1016/j.cej.2022.136951